公开(公告)号：US20240201580A1

公开(公告)日：2024-06-20

申请号：US18082948

申请日：2022-12-16

Applicant: Applied Materials, Inc.

Inventor： Nolan Layne ZIMMERMAN ,  Banqiu WU

IPC: G03F1/82 ,  G03F1/66 ,  G03F9/00

CPC classification number: G03F1/82 ,  G03F1/66 ,  G03F9/7046

Abstract: An automatic photomask handling assembly is employed for holding a photomask for cleaning processes in an atmospheric pressure plasma (APP) chamber. The automatic photomask handling assembly includes a set of stationary standoffs with each of the stationary standoffs having a first end solidly mounted to the photomask handling assembly and a second end that contacts an underside of a photomask. The automatic photomask handling assembly also has a handling stage that holds the photomask for processing. The handling stage has a set of through openings that allow the set of stationary standoffs to pass through the handling stage as the handling stage moves vertically. The handling stage also has a set of plates that automatically clamp and unclamp a photomask as the handling stage moves vertically. The set of plates completely surrounds the photomask such that the clamped photomask and the set of plates form a continuous surface.

公开(公告)号：US20230040192A1

公开(公告)日：2023-02-09

申请号：US17880212

申请日：2022-08-03

Applicant: Applied Materials, Inc.

Inventor： Jason RYE ,  Nolan Layne ZIMMERMAN

IPC: C23C16/458 ,  H01L21/67 ,  C23C16/44 ,  H01L21/687

Abstract: Embodiments of wet clean chambers are provided herein. In some embodiments, a wet clean chamber includes: a deck plate; a substrate support that is rotatable and configured to support a substrate; a rotor disposed about and configured to rotate with the substrate support, wherein the rotor includes an upper fluid collection region disposed radially outward of the substrate support in position to collect fluid leaving the substrate support during processing, and wherein the upper fluid collection region includes a plurality of drain openings along a radially outward perimeter of a bottom of the upper fluid collection region; a stationary housing surrounding the rotor and having a lower fluid collection region disposed beneath the drain openings of the rotor; and one or more fluid delivery arms coupled to the deck plate and configured to deliver fluid to the substrate.