-
公开(公告)号:US20230040192A1
公开(公告)日:2023-02-09
申请号:US17880212
申请日:2022-08-03
Applicant: Applied Materials, Inc.
Inventor: Jason RYE , Nolan Layne ZIMMERMAN
IPC: C23C16/458 , H01L21/67 , C23C16/44 , H01L21/687
Abstract: Embodiments of wet clean chambers are provided herein. In some embodiments, a wet clean chamber includes: a deck plate; a substrate support that is rotatable and configured to support a substrate; a rotor disposed about and configured to rotate with the substrate support, wherein the rotor includes an upper fluid collection region disposed radially outward of the substrate support in position to collect fluid leaving the substrate support during processing, and wherein the upper fluid collection region includes a plurality of drain openings along a radially outward perimeter of a bottom of the upper fluid collection region; a stationary housing surrounding the rotor and having a lower fluid collection region disposed beneath the drain openings of the rotor; and one or more fluid delivery arms coupled to the deck plate and configured to deliver fluid to the substrate.