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公开(公告)号:US12140494B2
公开(公告)日:2024-11-12
申请号:US18397977
申请日:2023-12-27
Applicant: Applied Materials, Inc.
Inventor: Jinxin Fu , Kang Luo , Fariah Hayee , Ludovic Godet
IPC: G01M11/02
Abstract: A method of optical device metrology is provided. The method includes introducing a first type of light into a first optical device during a first time period, the first optical device including an optical substrate and an optical film disposed on the optical substrate, the first optical device further including a first surface, a second surface, and one or more sides connecting the first surface with the second surface; and measuring, during the first time period, a quantity of the first type of light transmitted from a plurality of locations on the first surface or the second surface during the first time period, wherein the measuring is performed by a detector coupled to one or more fiber heads positioned to collect the light transmitted from the plurality of locations.
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公开(公告)号:US11867931B2
公开(公告)日:2024-01-09
申请号:US17448619
申请日:2021-09-23
Applicant: Applied Materials, Inc.
Inventor: Kang Luo , Xiaopei Deng , Daihua Zhang , Ludovic Godet
CPC classification number: G02B5/1857 , G03F7/0005 , G03F7/16
Abstract: Embodiments of the present disclosure generally relate to optical devices. More specifically, embodiments described herein relate to optical devices and methods of manufacturing optical devices having optical device structures with at least one of varying depths or refractive indices across the surface of a substrate. According to certain embodiments, an inkjet process is used to deposit a volumetrically variable optical device that is etched to form a diffractive optic element (DOE). Volumetrically variable can relate to the thickness of the optical device, or the relative volume of two or more diffractive materials deposited in combination. According to other embodiments, a single-profile DOE is deposited on a substrate and an inkjet process deposits a volumetrically variable organic material over the DOE. The DOE and organic material are etched to modify the profile of the structure, after which the organic material is removed, leaving the modified-profile DOE.
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公开(公告)号:US12111572B2
公开(公告)日:2024-10-08
申请号:US18333290
申请日:2023-06-12
Applicant: Applied Materials, Inc.
Inventor: Hao Tang , Kang Luo , Erica Chen , Yongan Xu
CPC classification number: G03F7/0005 , G02B5/1857 , G03F7/0002
Abstract: A method of imprinting a pattern on a substrate is provided. The method includes forming a first pattern on a plurality of masters using a method other than imprinting, the first pattern including a plurality of patterned features of varying sizes; measuring the patterned features at a plurality of locations on each of the masters; selecting a first master of the plurality of masters based on the measurements of the patterned features on each of the masters; using the first master to form a second pattern on an imprint template; and imprinting the first pattern on a first device with the imprint template.
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公开(公告)号:US11878532B2
公开(公告)日:2024-01-23
申请号:US17647820
申请日:2022-01-12
Applicant: Applied Materials, Inc.
Inventor: Daihua Zhang , Ludovic Godet , Michael David-Scott Kemp , Kang Luo , Kazuya Daito , Kenneth S. Ledford , Bahubali S. Upadhye , Hemantha Raju , John Rusconi , Elsa Massonneau , Mahendran Chidambaram , Alexey Stepanov , Visweswaren Sivaramakrishnan
Abstract: Embodiments described herein relate to an inkjet printing platform. The inkjet printing platform is utilized for fabrication of optical films and optical device structures. The inkjet printing platform includes a transfer chamber, one or more inkjet chambers, a plurality of auxiliary modules, a substrate flipper, and load ports. The inkjet printing platform is operable to perform an inkjet printing process on a substrate to form an optical film and/or an optical device.
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公开(公告)号:US12109641B2
公开(公告)日:2024-10-08
申请号:US17455288
申请日:2021-11-17
Applicant: Applied Materials, Inc.
Inventor: Kang Luo , Ludovic Godet , Daihua Zhang , Nai-Wen Pi , Jinrui Guo , Rami Hourani
CPC classification number: B23K10/00 , G02B6/0016 , G02B6/0036
Abstract: The present disclosure generally relates to a method and apparatus for forming a substrate having a graduated refractive index. A method of forming a waveguide structure includes expelling plasma from an applicator having a head toward a plurality of grating structures formed on a substrate. The plasma is formed in the head at atmospheric pressure. The method further includes changing a depth of the plurality of grating structures with the plasma by removing grating material from the plurality of grating structures.
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公开(公告)号:US11892367B2
公开(公告)日:2024-02-06
申请号:US17692573
申请日:2022-03-11
Applicant: Applied Materials, Inc.
Inventor: Jinxin Fu , Kang Luo , Fariah Hayee , Ludovic Godet
IPC: G01M11/02
CPC classification number: G01M11/0285 , G01M11/0207
Abstract: A method of optical device metrology is provided. The method includes introducing a first type of light into a first optical device during a first time period, the first optical device including an optical substrate and an optical film disposed on the optical substrate, the first optical device further including a first surface, a second surface, and one or more sides connecting the first surface with the second surface; and measuring, during the first time period, a quantity of the first type of light transmitted from a plurality of locations on the first surface or the second surface during the first time period, wherein the measuring is performed by a detector coupled to one or more fiber heads positioned to collect the light transmitted from the plurality of locations.
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公开(公告)号:US11873554B2
公开(公告)日:2024-01-16
申请号:US17655849
申请日:2022-03-22
Applicant: Applied Materials, Inc.
Inventor: Nai-Wen Pi , Jinxin Fu , Kang Luo , Ludovic Godet
CPC classification number: C23C14/48 , C03C23/0095 , C23C14/0031 , C23C14/021 , C23C14/5873 , G02B6/10
Abstract: Embodiments described herein provide for optical devices with methods of forming optical device substrates having at least one area of increased refractive index or scratch resistance. One method includes disposing an etch material on a discrete area of an optical device substrate or an optical device layer, disposing a diffusion material in the discrete area, and removing excess diffusion material to form an optical material in the optical device substrate or the optical device layer having a refractive index greater than or equal to 2.0 or a hardness greater than or equal to 5.5 Mohs.
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公开(公告)号:US20220091314A1
公开(公告)日:2022-03-24
申请号:US17448619
申请日:2021-09-23
Applicant: Applied Materials, Inc.
Inventor: Kang Luo , Xiaopei Deng , Daihua Zhang , Ludovic Godet
Abstract: Embodiments of the present disclosure generally relate to optical devices. More specifically, embodiments described herein relate to optical devices and methods of manufacturing optical devices having optical device structures with at least one of varying depths or refractive indices across the surface of a substrate. According to certain embodiments, an inkjet process is used to deposit a volumetrically variable optical device that is etched to form a diffractive optic element (DOE). Volumetrically variable can relate to the thickness of the optical device, or the relative volume of two or more diffractive materials deposited in combination. According to other embodiments, a single-profile DOE is deposited on a substrate and an inkjet process deposits a volumetrically variable organic material over the DOE. The DOE and organic material are etched to modify the profile of the structure, after which the organic material is removed, leaving the modified-profile DOE.
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公开(公告)号:US11884076B2
公开(公告)日:2024-01-30
申请号:US17647791
申请日:2022-01-12
Applicant: Applied Materials, Inc.
Inventor: Daihua Zhang , Kazuya Daito , Kang Luo , Elsa Massonneau , Alexey Stepanov , Ludovic Godet
CPC classification number: B41J2/16552 , B41J2/18 , B41J2002/16594
Abstract: Embodiments described herein provide for a fluid management system and a method of utilizing the fluid management system. The fluid management system includes a servicing fluid management system and an ink management system. The servicing fluid management system and the ink management system run in parallel within an inkjet chamber. The ink management system supports the flow of inkjet materials between a waste tank, one or more inkjet material supply tanks, an ink management module, and the inkjet printer. The servicing fluid management system supports the flow of servicing fluids between the waste tank, one or more servicing fluid supply tanks, a servicing fluid management module, and the inkjet printer.
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公开(公告)号:US11807008B2
公开(公告)日:2023-11-07
申请号:US17647780
申请日:2022-01-12
Applicant: Applied Materials, Inc.
Inventor: Daihua Zhang , Kang Luo , Kazuya Daito , Kenneth S. Ledford , Elsa Massonneau , Alexey Stepanov , Ludovic Godet , Mahendran Chidambaram , Visweswaren Sivaramakrishnan , Bahubali S. Upadhye , Hemantha Raju
IPC: B41J2/165
CPC classification number: B41J2/1652 , B41J2/16547
Abstract: Embodiments described herein relate to an inkjet service station and methods of servicing an inkjet printer with the inkjet service station. The inkjet service station is disposed in an inkjet printer of an inkjet chamber. The inkjet service station is operable to perform servicing operations on a processing apparatus of the inkjet printer. The servicing operations include at least one of printhead spitting, printhead purging, printhead flushing, printhead cleaning, printhead drying, or vacuum suction.
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