公开(公告)号：US20200309598A1

公开(公告)日：2020-10-01

申请号：US16539930

申请日：2019-08-13

Applicant: Applied Materials, Inc.

Inventor： Jinxin FU ,  Yifei WANG ,  Ian MCMACKIN ,  Rutger MEYER TIMMERMAN THIJSSEN ,  Ludovic GODET

IPC: G01J3/18 ,  G01J3/02 ,  G02B7/04

Abstract: Embodiments of the present disclosure relate to measurement systems and methods for diffracting light. The measurement system includes a stage, an optical arm, and one or more detector arms. The method of diffracting light includes a method of diffracting light is provided, including projecting light beams having wavelength λlaser to a first zone of a first substrate at the fixed beam angle θ0 and the maximum orientation angle ϕmax, obtaining a displacement angle Δθ, determining a target maximum beam angle θt-max, wherein θt-max=θ0=Δθ, and determining a test grating pitch Pt-grating by a modified grating pitch equation Pt-grating=λlaser/(sin θ0). The measurement system and method allow for measurement of nonuniform properties of regions of an optical device, such as grating pitches and grating orientations.