公开(公告)号：US20240014028A1

公开(公告)日：2024-01-11

申请号：US18370481

申请日：2023-09-20

Applicant: Applied Materials, Inc.

Inventor： Banqiu WU ,  Khalid MAKHAMREH ,  Hiroki OGAWA ,  Eliyahu Shlomo DAGAN

IPC: B08B3/10 ,  B08B3/04 ,  B08B13/00

CPC classification number: B08B3/10 ,  B08B3/041 ,  B08B13/00 ,  B08B2203/005

Abstract: A cleaning apparatus for cleaning a substrate includes a lamp for emitting ultraviolet radiation in an irradiation region; a housing that houses the lamp; a water deflector spaced below the housing, the water deflector having a water inlet for receiving a supply of ozonated water and a water outlet for discharging ozonated water irradiated by the lamp into a substrate processing region beneath the water deflector, and defining a water flow path between the water inlet and the water outlet, the water flow path extending in the irradiation region; an upper reflector extending along and above the lamp; and a lower reflector extending along and below the water deflector, wherein the upper reflector and the lower reflector at least partially define the irradiation region and reflect ultraviolet radiation toward the water flow path, and wherein the lower reflector shields the substrate from ultraviolet radiation emitted by the lamp.

公开(公告)号：US20230044618A1

公开(公告)日：2023-02-09

申请号：US17397088

申请日：2021-08-09

Applicant: Applied Materials, Inc.

Inventor： Banqiu WU ,  Khalid MAKHAMREH ,  Hiroki OGAWA ,  Eliyahu Shlomo DAGAN

IPC: H01L21/02 ,  B08B7/00 ,  B08B3/10

Abstract: A cleaning apparatus for cleaning a substrate includes a lamp for emitting ultraviolet radiation in an irradiation region; a housing that houses the lamp; a water deflector spaced below the housing, the water deflector having a water inlet for receiving a supply of ozonated water and a water outlet for discharging ozonated water irradiated by the lamp into a substrate processing region beneath the water deflector, and defining a water flow path between the water inlet and the water outlet, the water flow path extending in the irradiation region; an upper reflector extending along and above the lamp; and a lower reflector extending along and below the water deflector, wherein the upper reflector and the lower reflector at least partially define the irradiation region and reflect ultraviolet radiation toward the water flow path, and wherein the lower reflector shields the substrate from ultraviolet radiation emitted by the lamp.