APPARATUS WITH NEIGHBORING SPUTTER CATHODES AND METHOD OF OPERATION THEREOF
    1.
    发明申请
    APPARATUS WITH NEIGHBORING SPUTTER CATHODES AND METHOD OF OPERATION THEREOF 审中-公开
    具有相邻射灯阴极的装置及其操作方法

    公开(公告)号:US20160002770A1

    公开(公告)日:2016-01-07

    申请号:US14767258

    申请日:2013-02-25

    Abstract: An apparatus for deposition of a layer stack on a non-flexible substrate or on a substrate provided in a carrier is described. The apparatus includes a vacuum chamber, a transport system, wherein the transport system and the vacuum chamber are configured for inline deposition, a first support for a first rotatable sputter cathode rotatable around a first rotation axis within the vacuum chamber, wherein a first deposition zone for depositing a first material is provided, a second support for a second rotatable sputter cathode rotatable around a second rotation axis within the vacuum chamber, wherein a second deposition zone for depositing a second material is provided, wherein the first rotation axis and the second rotation axis have a distance from each other of 700 mm or below; and a separator structure between the first rotation axis and the second rotation axis, adapted to receive the first material sputtered towards the second deposition zone and the second material sputtered towards the first deposition zone, wherein apparatus is configured for deposition of the layer stack comprising a layer of the first material and a subsequent layer of the second material.

    Abstract translation: 描述了用于在非柔性基板上或在设置在载体中的基板上沉积层堆叠的装置。 所述设备包括真空室,输送系统,其中所述输送系统和所述真空室被配置为用于在线沉积,用于可围绕所述真空室内的第一旋转轴线旋转的第一可旋转溅射阴极的第一支撑件,其中第一沉积区域 提供用于沉积第一材料的第二支撑件,用于可在真空室内围绕第二旋转轴线旋转的第二可旋转溅射阴极的第二支撑件,其中提供用于沉积第二材料的第二沉积区域,其中第一旋转轴线和第二旋转 轴线彼此之间的距离为700mm以下; 以及在所述第一旋转轴线和所述第二旋转轴线之间的分离器结构,适于接收朝向所述第二沉积区域溅射的所述第一材料,并且所述第二材料溅射朝向所述第一沉积区域,其中,所述设备被构造用于沉积所述层叠体, 第一材料的层和第二材料的后续层。

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