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公开(公告)号:US20200270747A1
公开(公告)日:2020-08-27
申请号:US16791264
申请日:2020-02-14
Applicant: Applied Materials, Inc.
Inventor: Mats LARSSON , Kevin A. PAPKE , Chirag Shaileshbhai KHAIRNAR , Rajasekhar PATIBANDLA , Karthikeyan BALARAMAN , Balamurugan RAMASAMY , Kartik SHAH , Umesh M. KELKAR
IPC: C23C16/02 , C23C16/513 , C23C16/56 , C23C16/40
Abstract: One embodiment of the disclosure provides a method of fabricating a chamber component with a coating layer disposed on an interface layer with desired film properties. In one embodiment, a method of fabricating a coating material includes providing a base structure comprising an aluminum or silicon containing material, forming an interface layer on the base structure, wherein the interface layer comprises one or more elements from at least one of Ta, Al, Si, Mg, Y, or combinations thereof, and forming a coating layer on the interface layer, wherein the coating layer has a molecular structure of SivYwMgxAlyOz. In another embodiment, a chamber component includes an interface layer disposed on a base structure, wherein the interface layer is selected from at least one of Ta, Al, Si, Mg, Y, or combinations thereof, and a coating layer disposed on the interface layer, wherein the coating layer has a molecular structure of SivYwMgxAlyOz.
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公开(公告)号:US20230167543A1
公开(公告)日:2023-06-01
申请号:US18101944
申请日:2023-01-26
Applicant: Applied Materials, Inc.
Inventor: Mats LARSSON , Kevin A. PAPKE , Chirag Shaileshbhai KHAIRNAR , Rajasekhar PATIBANDLA , Karthikeyan BALARAMAN , Balamurugan RAMASAMY , Kartik SHAH , Umesh M. KELKAR
IPC: C23C16/02 , C23C16/40 , C23C16/56 , C23C16/513 , C23C16/44 , C04B35/18 , C04B35/44 , C04B35/10 , C04B35/20 , C04B35/505 , C04B35/14 , C04B35/04 , C04B35/16 , C04B35/01 , C04B35/195
CPC classification number: C23C16/0281 , C23C16/405 , C23C16/56 , C23C16/513 , C23C16/4404 , C04B35/18 , C04B35/44 , C04B35/10 , C04B35/20 , C04B35/505 , C04B35/14 , C04B35/04 , C04B35/16 , C04B35/01 , C04B35/195 , Y10S156/914 , Y10T428/1317 , Y10T428/12743 , Y10T428/1259 , Y10T428/12667 , Y10T428/12764 , Y10T428/12604 , Y10T428/31504 , Y10T428/12736 , Y10T428/1266 , Y10T428/12597 , Y10T428/12611 , Y10T428/31678 , C04B2235/96
Abstract: One embodiment of the disclosure provides a method of fabricating a chamber component with a coating layer disposed on an interface layer with desired film properties. In one embodiment, a method of fabricating a coating material includes providing a base structure comprising an aluminum or silicon containing material, forming an interface layer on the base structure, wherein the interface layer comprises one or more elements from at least one of Ta, Al, Si, Mg, Y, or combinations thereof, and forming a coating layer on the interface layer, wherein the coating layer has a molecular structure of SivYwMgxAlyOz. In another embodiment, a chamber component includes an interface layer disposed on a base structure, wherein the interface layer is selected from at least one of Ta, Al, Si, Mg, Y, or combinations thereof, and a coating layer disposed on the interface layer, wherein the coating layer has a molecular structure of SivYwMgxAlyOz.
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