公开(公告)号：US20240420937A1

公开(公告)日：2024-12-19

申请号：US18732308

申请日：2024-06-03

Applicant: Applied Materials, Inc.

Inventor： Yu Cheng LIU ,  Cheng-yuan LIN ,  Hsiang AN ,  Sam S. WANG

IPC: H01J37/34 ,  H01J37/317 ,  H01J37/32

Abstract: Embodiments of the present disclosure provide a radio frequency (RF) return device. One example RF return device generally includes a bracket for coupling to a chamber body, a cover coupled to the bracket, and a contact plate coupled to the cover and configured contact a substrate support. Using the RF return device described herein generally enables a reduction in temperature that the RF return device and its various components are exposed to, increasing the durability and lifetime of the RF return device. In addition, the RF return device disclosed herein may block chemicals (e.g., fluorine (F)) used in the process chamber from attacking components included in the RF return device, thereby providing enhanced protection to the RF return device.

公开(公告)号：US20240352584A1

公开(公告)日：2024-10-24

申请号：US18618937

申请日：2024-03-27

Applicant: Applied Materials, Inc.

Inventor： Yu-Hsuan WU ,  Teng Mao WANG ,  Yan-Chi PAN ,  Yi-Jiun SHIU ,  Jrjyan Jerry CHEN ,  Cheng-yuan LIN ,  Hsiao-Ling YANG ,  Yu-Min WANG ,  Wen-Hao WU

IPC: C23C16/455

CPC classification number: C23C16/45559

Abstract: The present disclosure generally provides an apparatus and method for gas diffuser support structure for a vacuum chamber. The gas diffuser support structure comprises a backing plate having a central bore, and a gas deflector having a length and a width unequal to the length coupled to the backing plate by a plurality of outward fasteners coupled to a plurality of outward threaded holes formed in the backing plate, in which a spacer is disposed between the backing plate and the gas deflector, and in which a length to width ratio of the gas deflector is about 0.1:1 to about 10:1.