专利检索 ap:("Applied Materials, Inc.") AND inv:"Bala Shyamala Balaji" 第 1 页

1.

发明公开
DIAGNOSTIC METHODS FOR SUBSTRATE MANUFACTURING CHAMBERS USING PHYSICS-BASED MODELS 审中-公开

公开(公告)号：US20230195074A1

公开(公告)日：2023-06-22

申请号：US17558507

申请日：2021-12-21

申请人： Applied Materials, Inc.

发明人： Venkata Ravishankar Kasibhotla , Tao Zhang , Xiaoqun Zou , Bala Shyamala Balaji

IPC分类号： G05B19/404 , G06N20/00

CPC分类号： G05B19/404 , G06N20/00 , G05B2219/37506

摘要： A method includes receiving first sensor data, generated during a manufacturing process by sensors associated with a substrate manufacturing chamber. The method further includes receiving simulated sensor data generated by a trained physics-based model. The method further includes determining which one or more components of the manufacturing chamber contribute to a difference between the first sensor data and the simulated sensor data. The method further includes causing performance of a corrective action in view of the difference.