公开(公告)号：US20250006487A1

公开(公告)日：2025-01-02

申请号：US18882099

申请日：2024-09-11

Applicant: Applied Materials, Inc.

Inventor： Daemian Raj BENJAMIN RAJ ,  Gregory Eugene CHICHKANOFF ,  Shailendra SRIVASTAVA ,  Sai Susmita ADDEPALLI ,  Nikhil Sudhindrarao JORAPUR ,  Abhigyan KESHRI ,  Allison YAU

IPC: H01L21/02 ,  C23C16/455 ,  C23C16/458 ,  C23C16/50 ,  H01J37/32 ,  H10B41/20 ,  H10B43/20

Abstract: In one example, a process chamber comprises a lid assembly, a first gas supply, second gas supply, a chamber body, and a substrate support. The lid assembly comprises a gas box, a gas conduit passing through the gas box, a blocker plate, and a showerhead. The gas box comprises a gas distribution plenum, and a distribution plate comprising a plurality of holes aligned with the gas distribution plenum. The blocker plate is coupled to the gas box forming a first plenum. The showerhead is coupled to the blocker plate forming a second plenum. The first gas supply is coupled to the gas distribution plenum, and the second gas supply system is coupled to the gas conduit. The chamber body is coupled to the showerhead, and the substrate support assembly is disposed within an interior volume of the chamber body, and is configured to support a substrate during processing.

公开(公告)号：US20230420245A1

公开(公告)日：2023-12-28

申请号：US18464805

申请日：2023-09-11

Applicant: Applied Materials, Inc.

Inventor： Daemian Raj BENJAMIN RAJ ,  Gregory Eugene CHICHKANOFF ,  Shailendra SRIVASTAVA ,  Sai Susmita ADDEPALLI ,  Nikhil Sudhindrarao JORAPUR ,  Abhigyan KESHRI ,  Allison YAU

IPC: H01L21/02 ,  C23C16/455 ,  C23C16/50 ,  C23C16/458 ,  H01J37/32

CPC classification number: H01L21/022 ,  C23C16/45536 ,  C23C16/50 ,  C23C16/45565 ,  H01L21/02164 ,  H01L21/0217 ,  H01L21/02274 ,  C23C16/4583 ,  H01J37/32449 ,  H01J37/3244 ,  H10B41/20

Abstract: In one example, a process chamber comprises a lid assembly, a first gas supply, second gas supply, a chamber body, and a substrate support. The lid assembly comprises a gas box, a gas conduit passing through the gas box, a blocker plate, and a showerhead. The gas box comprises a gas distribution plenum, and a distribution plate comprising a plurality of holes aligned with the gas distribution plenum. The blocker plate is coupled to the gas box forming a first plenum. The showerhead is coupled to the blocker plate forming a second plenum. The first gas supply is coupled to the gas distribution plenum, and the second gas supply system is coupled to the gas conduit. The chamber body is coupled to the showerhead, and the substrate support assembly is disposed within an interior volume of the chamber body, and is configured to support a substrate during processing.