公开(公告)号：US20170178867A1

公开(公告)日：2017-06-22

申请号：US15365497

申请日：2016-11-30

Applicant: Applied Materials, Inc.

Inventor： Jozef KUDELA ,  Allen K. LAU ,  Robin L. TINER ,  Gaku FURUTA ,  John M. WHITE ,  William Norman STERLING ,  Dongsuh LEE ,  Suhail ANWAR ,  Shinichi KURITA

IPC: H01J37/32

CPC classification number: H01J37/32449 ,  C23C16/45565 ,  C23C16/5096 ,  H01J37/32082 ,  H01J37/3244 ,  H01J37/32532 ,  H01J2237/3321

Abstract: In one embodiment, a diffuser for a deposition chamber includes a plate having edge regions and a center region, and plurality of gas passages comprising an upstream bore and an orifice hole fluidly coupled to the upstream bore that are formed between an upstream side and a downstream side of the plate, and a plurality of grooves surrounding the gas passages, wherein a depth of the grooves varies from the edge regions to the center region of the plate.

公开(公告)号：US20170081763A1

公开(公告)日：2017-03-23

申请号：US15249442

申请日：2016-08-28

Applicant: Applied Materials, Inc.

Inventor： Robin L. TINER ,  Allen K. LAU

IPC: C23C16/455 ,  C23C16/505 ,  B05B15/06

CPC classification number: C23C16/45565 ,  C23C16/5096 ,  H01J37/3244 ,  H01J37/32807

Abstract: Embodiments of the present disclosure generally provide apparatus and methods for supporting a gas distribution showerhead in a processing chamber. In one embodiment, a gas distribution showerhead for a vacuum chamber includes a rectangular body having four sides, a first major surface and a second major surface opposite the first major surface, and a plurality of gas passages formed through the body in a longitudinal direction between the first and second major surfaces, a center support member coupled to the body in a center region thereof, and a mid-support member coupled to the body between the center region and the side.

公开(公告)号：US20200165726A1

公开(公告)日：2020-05-28

申请号：US16201755

申请日：2018-11-27

Applicant: Applied Materials, Inc.

Inventor： Allen K. LAU ,  Hsiang AN ,  Lai ZHAO ,  Jianhua ZHOU ,  Robin L. TINER

IPC: C23C16/455 ,  C23C16/50

Abstract: Embodiments of the present disclosure generally provide apparatus and methods for a gas diffuser assembly for a vacuum chamber, the gas diffuser assembly comprising a mounting plate, the mounting plate comprising a hub, a plurality of curved spokes extending from the hub in a radial direction, a gusset portion coupled between the hub and each of the curved spokes, each of the gusset portions having a convex curve disposed in an axial direction, and one or more mounting holes coupled to the curved spokes.

公开(公告)号：US20200071833A1

公开(公告)日：2020-03-05

申请号：US16119505

申请日：2018-08-31

Applicant: Applied Materials, Inc.

Inventor： Allen K. LAU ,  Robin L. TINER ,  Lai ZHAO ,  Soo Young Choi

IPC: C23C16/455

Abstract: Embodiments of the present disclosure generally provide apparatus and methods for gas diffuser support structure for a vacuum chamber. The gas diffuser support structure comprises a backing plate having a central bore formed therethrough, an integrated cross structure formed in the central bore, and a gas deflector coupled to the cross structure by a single fastener.

公开(公告)号：US20200043706A1

公开(公告)日：2020-02-06

申请号：US16052304

申请日：2018-08-01

Applicant: Applied Materials, Inc.

Inventor： Jianheng LI ,  Lai ZHAO ,  Robin L. TINER ,  Allen K. LAU ,  Gaku FURUTA ,  Soo Young CHOI

IPC: H01J37/32 ,  C23C16/505

Abstract: Embodiments described herein generally relate to apparatus and methods for processing a substrate utilizing a high radio frequency (RF) power. The high RF power enables deposition of films on the substrate with more desirable properties. A first plurality of insulating members is disposed on a plurality of brackets and extends laterally inward from a chamber body. A second plurality of insulating members is disposed on the chamber body and extends from the first plurality of insulating members to a support surface of the chamber body. The insulating members reduce the occurrence of arcing between the plasma and the chamber body.