公开(公告)号：US20190161852A1

公开(公告)日：2019-05-30

申请号：US16092797

申请日：2016-05-02

Applicant: Applied Materials, Inc.

Inventor： Hyun Chan PARK ,  Thomas GEBELE ,  Ajay Sampath BHOOLOKAM

IPC: C23C14/35 ,  H01J37/34

Abstract: According to one aspect of the present disclosure, a method of coating a substrate with at least one cathode assembly having a sputter target and a magnet assembly that is rotatable around a rotation axis is provided. The method comprises: Coating of the substrate while moving the magnet assembly in a reciprocating manner in a first angular sector; and subsequent coating of the substrate while moving the magnet assembly in a reciprocating manner in a second angular sector different from the first angular sector. According to a second aspect, a coating apparatus for performing said method is provided.

公开(公告)号：US20210355578A1

公开(公告)日：2021-11-18

申请号：US17391145

申请日：2021-08-02

Applicant: Applied Materials, Inc.

Inventor： Hyun Chan PARK ,  Thomas GEBELE ,  Ajay Sampath BHOOLOKAM

IPC: C23C14/35 ,  H01J37/34

Abstract: According to one aspect of the present disclosure, a method of coating a substrate (100) with at least one cathode assembly (10) having a sputter target (20) and a magnet assembly (25) that is rotatable around a rotation axis (A) is provided. The method comprises: Coating of the substrate (100) while moving the magnet assembly in a reciprocating manner in a first angular sector (12); and subsequent coating of the substrate (100) while moving the magnet assembly (25) in a reciprocating manner in a second angular sector (14) different from the first angular sector (12). According to a second aspect, a coating apparatus for performing said method is provided.