公开(公告)号：US5391260A

公开(公告)日：1995-02-21

申请号：US37459

申请日：1993-03-26

申请人： Akitaka Makino ,  Naoyuki Tamura ,  Tetsunori Kaji

发明人： Akitaka Makino ,  Naoyuki Tamura ,  Tetsunori Kaji

IPC分类号： B01J3/02 ,  B01J19/08 ,  H01L21/00 ,  H01L21/205 ,  C23C16/00

CPC分类号： H01L21/67069 ,  Y10S438/935

摘要： To improve an actual exhaust speed, in a vacuum processing device for processing a work located in a vacuum processing chamber by using a processing gas introduced into the vacuum processing chamber, the vacuum processing device having means for introducing the processing gas into the vacuum processing chamber, means for controlling a gas flow of the processing gas, and means for exhausting the processing gas after the work is processed by the processing gas; the exhausting means comprises an exhaust pump, a buffer space extended in a direction substantially perpendicular to a center of the work with an extended area larger than a size of a suction port of the exhaust pump, and a gas outlet formed on a back side of a surface of the work to be processed, the gas outlet having a size substantially equal to or larger than the size of the suction port of the exhaust pump.

摘要翻译： 为了提高实际的排气速度，在真空处理装置中，通过使用引入到真空处理室中的处理气体来处理位于真空处理室中的工件的真空处理装置，该真空处理装置具有将处理气体引入真空处理室 用于控制处理气体的气体流动的装置，以及在处理气体处理了工件之后排出处理气体的装置; 排气装置包括排气泵，在大致垂直于工件中心的方向延伸的缓冲空间，其延伸面积大于排气泵的吸入口的尺寸;以及气体出口，形成在排气泵的背面 要处理的工件的表面，气体出口的尺寸基本上等于或大于排气泵的吸入口的尺寸。

公开(公告)号：US5607510A

公开(公告)日：1997-03-04

申请号：US394952

申请日：1995-02-27

申请人： Akitaka Makino ,  Naoyuki Tamura ,  Tetsunori Kaji

发明人： Akitaka Makino ,  Naoyuki Tamura ,  Tetsunori Kaji

IPC分类号： B01J3/02 ,  B01J19/08 ,  H01L21/00 ,  H01L21/205 ,  C23C16/02

CPC分类号： H01L21/67069 ,  Y10S438/935

摘要： To improve an actual exhaust speed, in a vacuum processing device for processing a work located in a vacuum processing chamber by using a processing gas introduced into the vacuum processing chamber, the vacuum processing device having means for introducing the processing gas into the vacuum processing chamber, means for controlling a gas flow of the processing gas, and means for exhausting the processing gas after the work is processed by the processing gas; the exhausting means comprises an exhaust pump, a buffer space extended in a direction substantially perpendicular to a center of the work with an extended area larger than a size of a suction port of the exhaust pump, and a gas outlet formed on a back side of a surface of the work to be processed, the gas outlet having a size substantially equal to or larger than the size of the suction port of the exhaust pump. Further, the exhaust arrangement can be provided at a shifted position so as to allow a work space beneath a work table.

摘要翻译： 为了提高实际的排气速度，在真空处理装置中，通过使用引入到真空处理室中的处理气体来处理位于真空处理室中的工件的真空处理装置，该真空处理装置具有将处理气体引入真空处理室 用于控制处理气体的气体流动的装置，以及在处理气体处理了工件之后排出处理气体的装置; 排气装置包括排气泵，在大致垂直于工件中心的方向延伸的缓冲空间，其延伸面积大于排气泵的吸入口的尺寸;以及气体出口，形成在排气泵的背面 要处理的工件的表面，气体出口的尺寸基本上等于或大于排气泵的吸入口的尺寸。 此外，排气装置可以设置在移动位置，以便允许工作台下方的工作空间。

公开(公告)号：US5580420A

公开(公告)日：1996-12-03

申请号：US307272

申请日：1994-09-16

申请人： Katsuya Watanabe ,  Tetsunori Kaji ,  Naoyuki Tamura ,  Kenji Nakata ,  Hiroyuki Shichida ,  Seiichi Watanabe ,  Sadayuki Okudaira ,  Keizo Suzuki

发明人： Katsuya Watanabe ,  Tetsunori Kaji ,  Naoyuki Tamura ,  Kenji Nakata ,  Hiroyuki Shichida ,  Seiichi Watanabe ,  Sadayuki Okudaira ,  Keizo Suzuki

IPC分类号： H01J37/32 ,  H01L21/00

CPC分类号： H01J37/32238 ,  H01J37/32192 ,  H01J37/32247 ,  H01J37/32275 ,  H01J37/32678

摘要： A microwave penetrating window and a cavity which are substantially equal in diameter to a plasma generating chamber are successively connected to the plasma generating chamber and microwaves are introduced via the cavity into the plasma generating chamber. A processing gas in the plasma generating chamber is converted into a plasma by means of the microwaves introduced into the plasma generating chamber and the microwaves in specific modes are resonated in between a microwave reflective interface with the plasma generated in the plasma generating chamber and the reflective edge face of the cavity. The microwaves in the specific modes are thus formed in the cavity and the energy of the microwaves in the specific modes is increased by resonance. The boosted energy is added to the plasma and the plasma is densified accordingly. Moreover, a plasma excellent in uniformity and stability can be generated by resonating the microwaves in the specific modes in the presence of a uniform electromagnetic field.

摘要翻译： 与等离子体发生室直径基本相等的微波穿透窗和空腔连续地连接到等离子体发生室，并且微波经由腔引入等离子体发生室。 等离子体发生室中的处理气体通过引入到等离子体发生室中的微波转换为等离子体，并且特定模式中的微波共振在与等离子体发生室中产生的等离子体的微波反射界面和反射 空腔的边缘面。 因此，特定模式中的微波形成在空腔中，并且特定模式中的微波的能量通过共振增加。 将升高的能量加入到等离子体中，并且等离子体相应地致密化。 此外，通过在存在均匀电磁场的情况下在特定模式中谐振微波，可以产生均匀性和稳定性优异的等离子体。

公开(公告)号：US5458687A

公开(公告)日：1995-10-17

申请号：US154078

申请日：1993-11-18

申请人： Hiroyuki Shichida ,  Naoyuki Tamura ,  Akitaka Makino

发明人： Hiroyuki Shichida ,  Naoyuki Tamura ,  Akitaka Makino

IPC分类号： C23C16/50 ,  C23C16/458 ,  C23C16/511 ,  C23F4/00 ,  H01J37/02 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/683 ,  C23C16/00

CPC分类号： H01J37/3244 ,  C23C16/4586 ,  H01J37/026 ,  H01L21/6831 ,  H01J2237/0203 ,  H01J2237/2001

摘要： A wafer processing apparatus comprises a vacuum processing chamber, and a wafer holder disposed within the vacuum processing chamber to hold a wafer to be processed fixedly thereon by electrostatic attraction. A cooling or heating gas is supplied into the space between the surface of the wafer holder and the backside of a wafer set on the wafer holder to cool or heat the wafer. In case the electrostatic attraction disappears accidentally due to, for example, power failure, the cooling or heating gas in the space between the surface of the wafer holder and the backside of the wafer set on the wafer holder is discharged quickly upon the disappearance of the electrostatic attraction between the wafer holder and the wafer to prevent the wafer being caused to float and being dislocated by the pressure of the cooling or heating gas existing in the space between the surface of the wafer holder and the backside of the wafer.

摘要翻译： 晶片处理装置包括真空处理室和设置在真空处理室内的晶片保持器，以通过静电吸引将待固化的晶片保持在其上。 将冷却或加热气体供应到晶片保持器的表面和晶片保持器上设置的晶片的背面之间的空间中以冷却或加热晶片。 在静电吸引由于例如电源故障而意外地消失的情况下，在晶片保持器的表面和晶片保持器上设置的晶片的背面之间的空间中的冷却或加热气体在消失时被快速放电 晶片保持器和晶片之间的静电吸引，以防止晶片由于存在于晶片保持器的表面和晶片的背面之间的空间中的冷却或加热气体的压力而浮起而脱位。

公开(公告)号：US20100123337A1

公开(公告)日：2010-05-20

申请号：US12616969

申请日：2009-11-12

申请人： Naoyuki Tamura ,  Koji Satoh ,  Hiroaki Ueno ,  Takeharu Endo

发明人： Naoyuki Tamura ,  Koji Satoh ,  Hiroaki Ueno ,  Takeharu Endo

IPC分类号： B62D25/00

CPC分类号： B62D25/02 ,  B62D25/025 ,  B62D25/2036

摘要： Outer side sill member includes an upper wall section slanting upward in a horizontal, outer-to-inner direction, and a lower wall section slanting downward in the horizontal, outer-to-inner direction. At least one of upper and lower wall sections of the outer side sill member has a channel-shaped bead extending along the side sill, so that the side sill has a polygonal closed sectional shape extending in the front-rear direction of the vehicle. The bead has a bottom portion having a width greater than a vertical dimension in a direction orthogonal to the surface of the bottom portion. Each of bulkheads, partitioning the interior of the side sill, is fixedly joined to the outer side sill member with its recessed edge portion substantially fittingly engaging with the bottom portion of the depressed wall portion of the outer side sill member.

摘要翻译： 外侧纵梁构件包括在水平方向，内外方向向上倾斜的上壁部和在水平方向，内外方向上向下倾斜的下壁部。 外侧纵梁构件的上壁部和下壁部中的至少一个具有沿着下纵梁延伸的通道形凸缘，使得下纵梁具有沿车辆前后方向延伸的多边形封闭截面形状。 胎圈具有在垂直于底部表面的方向上具有大于垂直尺寸的宽度的底部。 分隔下梁的内部的每个隔板固定地接合到外侧门槛构件，其凹边缘部分基本上与外侧槛构件的凹陷壁部分的底部嵌合。

公开(公告)号：US07040639B2

公开(公告)日：2006-05-09

申请号：US10654039

申请日：2003-09-03

申请人： Naoyuki Tamura

发明人： Naoyuki Tamura

IPC分类号： B62D21/11

CPC分类号： B62D25/088

摘要： A vehicle body structure for securing sufficient interior space and for opposing the load for forcing the suspension to fall sideward by effectively using the existing members of the body structure, thereby improving the rigidity of the vehicle body. The structure has damper bases provided at both sides of the vehicle; a cross member portion between the damper bases; and gussets fastened to both ends of the cross member portion. Each gusset is attached at the outside of an interior of the vehicle to an upper wall and a side wall of each damper base, and typically has an upper wall combined with a bottom face of the upper wall of the damper base; a side wall fastened to an outer face of the side wall of the damper base; and front and rear walls, each being joined to the upper and side walls of the gusset.

摘要翻译： 一种用于确保足够的内部空间并且用于相对于负载的车体结构，用于通过有效地利用车身结构的现有构件来迫使悬架侧向下降，从而提高车体的刚性。 该结构在车辆两侧设有阻尼器底座; 阻尼器基座之间的横向构件部分; 和固定在横向构件部分的两端的角撑板。 每个角撑板在车辆内部的外侧附接到每个阻尼器底座的上壁和侧壁，并且通常具有与阻尼器底座的上壁的底面结合的上壁; 紧固在所述阻尼器基座的侧壁的外表面上的侧壁; 以及前壁和后壁，每个都连接到角撑板的上壁和侧壁。

公开(公告)号：US06676805B2

公开(公告)日：2004-01-13

申请号：US10107138

申请日：2002-03-28

申请人： Naoyuki Tamura ,  Kazue Takahashi ,  Youichi Ito ,  Yoshifumi Ogawa ,  Hiroyuki Shichida ,  Tsunehiko Tsubone

发明人： Naoyuki Tamura ,  Kazue Takahashi ,  Youichi Ito ,  Yoshifumi Ogawa ,  Hiroyuki Shichida ,  Tsunehiko Tsubone

IPC分类号： H05H100

CPC分类号： H01L21/6835 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/6833 ,  H01L2924/3025 ,  Y10T279/23

摘要： A method and system of holding a substrate where foreign substances on the back surface can be decreased. The substrate holding system comprises a ring-shaped leakage-proof surface having a smooth surface on the specimen table corresponding to the periphery of the substrate, a plurality of contact holding portions within the periphery of the substrate, and electrostatic attraction means for fixing the substrate by contacting the back surface of the substrate to the ring-shaped leakage-proof surface and the contact holding portions. The substrate contacts to the cooling surface at the ring-shaped leakage-proof surface and the contact holding portion placed on a position inside the ring-shaped leakage-proof surface. The back surface of the substrate and the cooling surface do not contact to each other in the large portion of the remaining area.

摘要翻译： 可以减少背面上的异物的保持基板的方法和系统。 基板保持系统包括：在与基板周边相对应的样品台上具有光滑表面的环形防漏表面，在基板周边内的多个接触保持部分，以及用于固定基板的静电吸引装置 通过使基板的背面与环状的防漏面和接触保持部接触。 基板在环状防漏面与冷却面接触，接触保持部位置于环状防漏面内。 衬底的背面和冷却表面在剩余区域的大部分中彼此不接触。

公开(公告)号：US5906684A

公开(公告)日：1999-05-25

申请号：US50417

申请日：1998-03-31

申请人： Naoyuki Tamura ,  Kazue Takahashi ,  Youichi Ito ,  Yoshifumi Ogawa ,  Hiroyuki Shichida ,  Tsunehiko Tsubone

发明人： Naoyuki Tamura ,  Kazue Takahashi ,  Youichi Ito ,  Yoshifumi Ogawa ,  Hiroyuki Shichida ,  Tsunehiko Tsubone

IPC分类号： H01L21/00 ,  H01L21/68 ,  H01L21/683 ,  C23C16/00 ,  H05H1/00

CPC分类号： H01L21/6835 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/6833 ,  H01L2924/3025 ,  Y10T279/23

摘要： In a method of holding a substrate and a substrate holding system where, the amount of foreign substances on the back surface of the substrate can be decreased and only a small amount of foreign substances transferred from a mounting table to the substrate. For this purpose, the substrate holding system has a ring-shaped leakage-proof surface providing a smooth support surface on the specimen table corresponding to the periphery of the substrate, a plurality of contact holding portions which bear against the substrate on the specimen table between the corresponding position to the periphery of the substrate and the corresponding position to the center of the substrate, and electrostatic attraction means for fixing the substrate by contacting the back surface of the substrate to the ring-shaped leakage-proof surface and the contact holding portions. The substrate is exposed to a cooling surface at the ring-shaped leakage-proof surface and the contact holding portion placed at a position inside the ring-shaped leakage-proof surface. The back surface of the substrate and the cooling surface do not contact each other in the large portion of the remaining area.

摘要翻译： 在保持基板和基板保持系统的方法中，可以减少基板的背面上的异物量，并且只有少量的异物从安装台传递到基板。 为此，基板保持系统具有环形防漏表面，在对应于基板的周边的样品台上提供平滑的支撑表面，多个接触保持部分抵靠在样品台上的基板上， 与基板周边相对应的位置和与基板中心相对应的位置，以及静电吸引装置，用于通过使基板的背面与环状的防漏表面接触而固定基板，以及接触保持部 。 将基板暴露于环状防漏表面处的冷却表面和位于环形防漏表面内的位置处的接触保持部。 基板的后表面和冷却表面在剩余区域的大部分中彼此不接触。

公开(公告)号：US5685684A

公开(公告)日：1997-11-11

申请号：US612465

申请日：1996-03-07

申请人： Shigekazu Kato ,  Naoyuki Tamura ,  Kouji Nishihata ,  Tsunehiko Tsubone ,  Atsushi Itou ,  Kenji Nakata ,  Yoshifumi Ogawa

发明人： Shigekazu Kato ,  Naoyuki Tamura ,  Kouji Nishihata ,  Tsunehiko Tsubone ,  Atsushi Itou ,  Kenji Nakata ,  Yoshifumi Ogawa

IPC分类号： B65G49/07 ,  H01L21/677 ,  B65H5/08

CPC分类号： H01L21/67778 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

摘要： A vacuum treating apparatus having a vacuum treating chamber for treating a to-be-treated substrate in vacuum, includes a plurality of substrate cassettes which are installed in the open air and hold substrates that are to be conveyed into the vacuum treating chamber, a device for conveying the substrates between the substrate cassettes and the vacuum treating chamber, and a device which selects either that the to-be-treated substrate after treated in the vacuum treating chamber be held in the substrate cassette from which the to-be-treated substrate was taken out or that the to-be-treated substrate after treated in the vacuum treating chamber be held in another substrate cassette which is different from the substrate cassette.

摘要翻译： 一种具有真空处理室的真空处理装置，其特征在于，包括：多个基板盒，其安装在所述露天空间中并保持要被输送到所述真空处理室的基板;装置 用于在基板盒和真空处理室之间输送基板，以及选择在真空处理室中处理后的被处理基板被保持在待处理基板的基板盒中的装置 或将真空处理室中处理后的被处理基板保持在与基板盒不同的另一基板盒中。

公开(公告)号：US5326009A

公开(公告)日：1994-07-05

申请号：US37530

申请日：1993-03-26

申请人： Yoshinori Kobayashi ,  Naoyuki Tamura ,  Haruo Sasako

发明人： Yoshinori Kobayashi ,  Naoyuki Tamura ,  Haruo Sasako

IPC分类号： D04H3/03 ,  B65H20/14 ,  D01G25/00

CPC分类号： D04H3/03

摘要： An air nozzle for use in the production of nonwoven fabric that is adapted to receive spun filaments from a spinning nozzle and feed the filaments in an air jet into a receiver. The air nozzle is directed to the prevention of any abrasion of the inner surface of the nozzle body by an additive, such as titanium white, contained in filaments, and thus to the prevention of any defects in the nonwoven fabric. The inner surface of a nozzle body for guiding filaments is formed using a ceramic material to protect that surface. The nozzle body has a conical passage whose diameter gradually decreases from an inlet for receiving the filaments from the spinning nozzle, and a straight passage continuing from the conical passage and extending with a constant diameter, at least part of the inner surface of the conical passage and/or the straight passage being formed as a ceramic surface.

摘要翻译： 一种用于制造无纺布的空气喷嘴，其适于从纺丝喷嘴接收纺丝丝，并将空气喷嘴中的长丝进料到接收器中。 空气喷嘴针对防止由长丝包含的钛白等添加剂防止喷嘴体的内表面的任何磨损，从而防止无纺布中的任何缺陷。 用于引导细丝的喷嘴体的内表面使用陶瓷材料形成以保护该表面。 喷嘴体具有锥形通道，其直径从用于从纺丝喷嘴接收长丝的入口逐渐减小，并且直径从锥形通道延伸并且以恒定直径延伸，锥形通道的内表面的至少一部分 和/或直通道形成为陶瓷表面。