公开(公告)号：US12165830B2

公开(公告)日：2024-12-10

申请号：US17708517

申请日：2022-03-30

Applicant: ASML Netherlands B.V.

Inventor： Shichen Gu ,  Weiming Ren ,  Qingpo Xi

IPC: H01J37/09 ,  H01J37/20 ,  H01J37/28

Abstract: Systems and methods of enhancing imaging resolution by reducing crosstalk between detection elements of a secondary charged-particle detector in a multi-beam apparatus are disclosed. The multi-beam apparatus may comprise an electro-optical system comprising a beam-limit aperture plate having a surface substantially perpendicular to an optical axis, the beam-limit aperture plate comprising a first aperture at a first distance relative to the surface of the beam-limit aperture plate, and a second aperture at a second distance relative to the surface of the beam-limit aperture plate, the second distance being different from the first distance. The first aperture may be a part of a first set of apertures of the beam-limit aperture plate at the first distance, and the second aperture may be a part of a second set of apertures of the beam-limit aperture plate at the second distance.