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公开(公告)号：US10558130B2
公开(公告)日：2020-02-11
申请号：US16352907
申请日：2019-03-14
Applicant: ASML NETHERLANDS B.V.
Abstract: A lithographic apparatus applies a device pattern at multiple fields across a substrate. A height map is decomposed into a plurality of components. A first height map component represents topographical variations associated with the device pattern. One or more further height map components represent other topographical variations. Using each height map component, control set-points are calculated according to a control algorithm specific to each component. The control set-points calculated for the different height map components are then combined and used to control imaging of the device pattern to the substrate. The specific control algorithms can be different from one another, and may have differing degrees of nonlinearity. The combining of the different set-points can be linear. Focus control in the presence of device-specific topography and other local variations can be improved.
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Patent Agency Ranking
公开(公告)号：US11249404B2
公开(公告)日：2022-02-15
申请号：US16619821
申请日：2018-05-18
Applicant: ASML Netherlands B.V.
Inventor： Emil Peter Schmitt-Weaver , Kaustuve Bhattacharyya , Rene Marinus Gerardus Johan Queens , Wolfgang Helmut Henke , Wim Tjibbo Tel , Theodorus Franciscus Adrianus Maria Linschoten
IPC: G03F9/00
Abstract: A system comprises a topography measurement system configured to determine a respective height for each of a plurality of locations on a substrate; and a processor configured to: determine a height map for the substrate based on the determined heights for the plurality of locations; and determine at least one alignment parameter for the substrate by comparing the height map and a reference height map, wherein the reference height map comprises or represents heights for a plurality of locations on a reference substrate portion.
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公开(公告)号：US11150565B2
公开(公告)日：2021-10-19
申请号：US15748643
申请日：2016-08-09
Applicant: ASML NETHERLANDS B.V.
Abstract: A lithographic apparatus is used to manufacture a plurality of devices on a substrate. A height map is obtained representing a topographical variation across the substrate. Using the height map the apparatus controls imaging of a field pattern at multiple field locations across the substrate. The field pattern includes a plurality of individual device areas. For field locations near the substrate's edge, the height map data is used selectively so as to ignore topographical variations in one or more individual device areas. Whether a device area is to be ignored is determined at least partly based on the height map data obtained for the current exposure. Alternatively or in addition, the selection can be based on measurements made at the corresponding device area and field location on one or more prior substrates, and/or on the same substrate in a previous layer.
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4.发明申请公开(公告)号：US20190212664A1
公开(公告)日：2019-07-11
申请号：US16352907
申请日：2019-03-14
Applicant: ASML NETHERLANDS B.V.
Abstract: A lithographic apparatus applies a device pattern at multiple fields across a substrate. A height map is decomposed into a plurality of components. A first height map component represents topographical variations associated with the device pattern. One or more further height map components represent other topographical variations. Using each height map component, control set-points are calculated according to a control algorithm specific to each component. The control set-points calculated for the different height map components are then combined and used to control imaging of the device pattern to the substrate. The specific control algorithms can be different from one another, and may have differing degrees of nonlinearity. The combining of the different set-points can be linear. Focus control in the presence of device-specific topography and other local variations can be improved.
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公开(公告)号：US10684557B2
公开(公告)日：2020-06-16
申请号：US16085608
申请日：2017-04-04
Applicant: ASML NETHERLANDS B.V.
Abstract: A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. A functional relationship between local height deviations across a substrate and focus information, such as a determined focus amount, is determined for a substrate, e.g., a reference substrate. Height deviations are subsequently measured for another substrate, e.g. a production substrate. The height deviations for the subsequent substrate and the functional relationship are used to determine predicted focus information for the subsequent substrate. The predicted focus information is then used to control the lithographic apparatus to apply a product pattern to the product substrate.
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公开(公告)号：US10274849B2
公开(公告)日：2019-04-30
申请号：US15743661
申请日：2016-07-05
Applicant: ASML NETHERLANDS B.V.
Abstract: A lithographic apparatus applies a device pattern at multiple fields across a substrate. A height map is decomposed into a plurality of components. A first height map component represents topographical variations associated with the device pattern. One or more further height map components represent other topographical variations. Using each height map component, control set-points are calculated according to a control algorithm specific to each component. The control set-points calculated for the different height map components are then combined and used to control imaging of the device pattern to the substrate. The specific control algorithms can be different from one another, and may have differing degrees of nonlinearity. The combining of the different set-points can be linear. Focus control in the presence of device-specific topography and other local variations can be improved.
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