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1.发明授权Lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method for providing setpoint data and a computer program 有权光刻设备，用于提供设定点数据的设备，设备制造方法，用于提供设定点数据的方法和计算机程序公开(公告)号：US09354502B2
公开(公告)日：2016-05-31
申请号：US14360888
申请日：2012-12-13
Applicant: ASML Netherlands B.V.
Inventor： Erik Roelof Loopstra , Martinus Hendricus Hoeks
CPC classification number: G03B27/72 , G03B27/32 , G03F7/70291 , G03F7/70391 , G03F7/70508
Abstract: An apparatus or method to calculate target dose values of a plurality of radiation beams at a plurality of different times in order to form a desired dose pattern on a target, each target dose value defining the dose distribution of a spot exposure formed by the radiation beam to which the target dose value is applied, wherein a nominal position of a characteristic point in the dose distribution of each of the spot exposures lies at a point of a spot exposure grid, and to provide target dose values at the resolution of the spot exposure grid by calculating target dose values at grid points on a lower resolution grid, the lower resolution grid having a resolution lower than the spot exposure grid, and for each of the calculated target dose values, deriving a target dose value at each of a plurality of points in the spot exposure grid.
Abstract translation: 一种用于在多个不同时间计算多个辐射束的目标剂量值以便在靶上形成所需剂量图案的装置或方法，每个目标剂量值定义由辐射束形成的斑点曝光的剂量分布 其中施加目标剂量值，其中每个斑点曝光的剂量分布中的特征点的标称位置位于点曝光栅格的点处，并且在点曝光的分辨率下提供目标剂量值 网格通过计算较低分辨率网格上的网格点处的目标剂量值，分辨率低于点曝光网格的分辨率网格，以及针对每个计算的目标剂量值，在多个 点曝光网格。
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2.发明申请公开(公告)号：US20150227036A1
公开(公告)日：2015-08-13
申请号：US14360888
申请日：2012-12-13
Applicant: ASML Netherlands B.V.
Inventor： Erik Roelof Loopstra , Martinus Hendricus Hoeks
CPC classification number: G03B27/72 , G03B27/32 , G03F7/70291 , G03F7/70391 , G03F7/70508
Abstract: An apparatus or method to calculate target dose values of a plurality of radiation beams at a plurality of different times in order to form a desired dose pattern on a target, each target dose value defining the dose distribution of a spot exposure formed by the radiation beam to which the target dose value is applied, wherein a nominal position of a characteristic point in the dose distribution of each of the spot exposures lies at a point of a spot exposure grid, and to provide target dose values at the resolution of the spot exposure grid by calculating target dose values at grid points on a lower resolution grid, the lower resolution grid having a resolution lower than the spot exposure grid, and for each of the calculated target dose values, deriving a target dose value at each of a plurality of points in the spot exposure grid.
Abstract translation: 一种用于在多个不同时间计算多个辐射束的目标剂量值以便在靶上形成所需剂量图案的装置或方法，每个目标剂量值定义由辐射束形成的斑点曝光的剂量分布 其中施加目标剂量值，其中每个斑点曝光的剂量分布中的特征点的标称位置位于点曝光栅格的点处，并且在点曝光的分辨率下提供目标剂量值 网格通过计算较低分辨率网格上的网格点处的目标剂量值，分辨率低于点曝光网格的分辨率网格，以及针对每个计算的目标剂量值，在多个 点曝光网格。
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