公开(公告)号：US10268128B2

公开(公告)日：2019-04-23

申请号：US15742168

申请日：2016-06-14

Applicant: ASML Netherlands B.V.

Inventor： Franciscus Johannes Joseph Janssen ,  Johannes Paul Marie De La Rosette ,  Edwin Cornelis Kadijk ,  Nicolas Alban Lallemant ,  Jan Liefooghe ,  Markus Rolf Werner Matthes ,  Marcel Johannus Elisabeth Hubertus Muitjens ,  Hubert Matthieu Richard Steijns ,  André Gillis Van De Velde ,  Marinus Aart Van Den Brink

IPC: G03F7/20 ,  H01S3/036 ,  H01S3/04 ,  H01S3/041 ,  H01S3/23 ,  H05G2/00 ,  F28C1/08 ,  H01S3/038 ,  H01S3/223

Abstract: A lithographic apparatus comprising an illumination system configured to condition a radiation beam, a support structure constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto the substrate, the lithographic apparatus being provided with a first cooling fluid circuit which is configured to cool components to a first temperature, and provided with a second cooling fluid circuit which is configured to cool components to a second temperature that is lower than the first temperature.