公开(公告)号：US12248255B2

公开(公告)日：2025-03-11

申请号：US17916730

申请日：2021-03-09

Applicant: ASML Netherlands B.V.

Inventor： Hubert Matthieu Richard Steijns ,  Pulkit Aggarwal

IPC: G03F7/00 ,  G01F1/06 ,  G01F1/86 ,  G01M3/38

Abstract: A system for measuring the difference between a property of a first target and a property of a second target, the system comprising a first member and a second member, wherein the first member comprises a first pattern, and the speed of rotation of the first member is configured to be based on the property of the first target; and the second member comprises a second pattern wherein, the speed of rotation of the second member is configured to be based on the property of the second target, further wherein the first and second pattern are angularly-varying and are configured to generate an interference pattern by their interaction when the first and second members have a relative difference in their rotational speeds, the interference pattern being indicative of the magnitude of this difference.

公开(公告)号：US10268128B2

公开(公告)日：2019-04-23

申请号：US15742168

申请日：2016-06-14

Applicant: ASML Netherlands B.V.

Inventor： Franciscus Johannes Joseph Janssen ,  Johannes Paul Marie De La Rosette ,  Edwin Cornelis Kadijk ,  Nicolas Alban Lallemant ,  Jan Liefooghe ,  Markus Rolf Werner Matthes ,  Marcel Johannus Elisabeth Hubertus Muitjens ,  Hubert Matthieu Richard Steijns ,  André Gillis Van De Velde ,  Marinus Aart Van Den Brink

IPC: G03F7/20 ,  H01S3/036 ,  H01S3/04 ,  H01S3/041 ,  H01S3/23 ,  H05G2/00 ,  F28C1/08 ,  H01S3/038 ,  H01S3/223

Abstract: A lithographic apparatus comprising an illumination system configured to condition a radiation beam, a support structure constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto the substrate, the lithographic apparatus being provided with a first cooling fluid circuit which is configured to cool components to a first temperature, and provided with a second cooling fluid circuit which is configured to cool components to a second temperature that is lower than the first temperature.