公开(公告)号：US20180196361A1

公开(公告)日：2018-07-12

申请号：US15742168

申请日：2016-06-14

Applicant: ASML Netherlands B.V.

Inventor： Franciscus Johannes Joseph JANSSEN ,  Johannes Paul Marie DE LA ROSETTE ,  Edwin Cornelis KADIJK ,  Nicolas Alban LALLEMANT ,  Jan LIEFOOGHE ,  Markus Rolf Werner MATTHES ,  Marcel Johannus Elisabeth MUITJENS ,  Hubert Matthieu Richard STEIJNS ,  André Gillis VAN DE VELDE ,  Marinus Aart VAN DEN BRINK

IPC: G03F7/20 ,  H01S3/23 ,  H01S3/04 ,  H01S3/038 ,  H01S3/041 ,  H01S3/036 ,  H05G2/00 ,  F28C1/08

CPC classification number: G03F7/70891 ,  F28C1/08 ,  G03F7/70025 ,  G03F7/70033 ,  G03F7/708 ,  G03F7/70858 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0407 ,  H01S3/041 ,  H01S3/2232 ,  H01S3/2308 ,  H05G2/008

Abstract: A lithographic apparatus comprising an illumination system configured to condition a radiation beam, a support structure constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto the substrate, the lithographic apparatus being provided with a first cooling fluid circuit which is configured to cool components to a first temperature, and provided with a second cooling fluid circuit which is configured to cool components to a second temperature that is lower than the first temperature.