公开(公告)号：US09983482B2

公开(公告)日：2018-05-29

申请号：US14775263

申请日：2014-02-26

Applicant: ASML Netherlands B.V. ,  Carl Zeiss SMT GmbH

Inventor： Erik Roelof Loopstra ,  Olav Waldemar Vladimir Frijns ,  Stig Bieling ,  Antonius Theodorus Wilhelmus Kempen ,  Ivo Vanderhallen ,  Nicolaas Ten Kate ,  Ruud Antonius Catharina Maria Beerens ,  Richard Henricus Adrianus Van Lieshout ,  Theodorus Petrus Maria Cadee ,  Sjoerd Nicolaas Lambertus Donders ,  Alexander Matthijs Struycken ,  Marcus Petrus Scheepers

IPC: G03B27/54 ,  G03F7/20 ,  G21K1/06 ,  G02B5/08 ,  G02B19/00 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G02B5/0891 ,  G02B19/0095 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70916 ,  G03F7/70983 ,  G21K1/067 ,  H05G2/003 ,  H05G2/008

Abstract: A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another.

公开(公告)号：US12235585B2

公开(公告)日：2025-02-25

申请号：US17764865

申请日：2020-09-08

Applicant: ASML Netherlands B.V.

Inventor： Remco Johannes Elisa Heijmans ,  Gerrit Van Der Straaten ,  Ivo Vanderhallen ,  Jan Steven Christiaan Westerlaken

IPC: G03F7/00 ,  H05G2/00

Abstract: A radiation source for an EUV lithography apparatus is disclosed. The radiation source comprises a chamber comprising a plasma formation region, a radiation collector arranged in the chamber and configured to collect radiation emitted at the plasma formation region and to direct the collected radiation towards an intermediate focus region, and a radiation conduit disposed between the radiation collector and the intermediate focus region. The radiation conduit comprises at least one outlet on an inner surface of a wall of the radiation conduit for directing a protective gas flow, and at least one guide portion extending from the inner surface of the wall of the radiation conduit and configured to redirect the protective gas flow. Also disclosed is a method of reducing debris and/or vapor deposition in the radiation conduit by providing a protective gas flow to the at least one outlet of the radiation conduit.