公开(公告)号：US09360770B2

公开(公告)日：2016-06-07

申请号：US14562133

申请日：2014-12-05

Applicant: ASML Netherlands B.V.

Inventor： Arend Johannes Kisteman ,  Wim Tjibbo Tel ,  Thomas Theeuwes ,  Antoine Gaston Marie Kiers

IPC: G03B27/32 ,  G03B27/52 ,  G03C5/00 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70641 ,  G03F7/70616 ,  G03F7/70625 ,  G03F9/7026

Abstract: A method of, and associated apparatus for, determining focus corrections for a lithographic projection apparatus. The method comprises exposing a plurality of global correction fields on a test substrate, each comprising a plurality of global correction marks, and each being exposed with a tilted focus offset across it; measuring a focus dependent characteristic for each of the plurality of global correction marks to determine interfield focus variation information; and calculating interfield focus corrections from the interfield focus variation information.