公开(公告)号：US11656555B2

公开(公告)日：2023-05-23

申请号：US17605601

申请日：2020-04-14

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Janardan Nath ,  Kalyan Kumar Mankala ,  Todd R. Downey ,  Joseph Harry Lyons ,  Ozer Unluhisarcikli ,  Alexander Harris Ledbetter ,  Nicholas Stephen Apone ,  Tian Gang

IPC: G03F7/20

CPC classification number: G03F7/70191 ,  G03F7/70083 ,  G03F7/70133

Abstract: An illumination adjustment apparatus, to adjust a cross slot illumination of a beam in a lithographic apparatus, includes a plurality of fingers to adjust the cross slot illumination to conform to a selected intensity profile. Each finger has a distal edge that includes at least two segments. The two segments form an indentation of the distal edge.

公开(公告)号：US11906907B2

公开(公告)日：2024-02-20

申请号：US16765339

申请日：2018-11-27

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Derk Servatius Gertruda Brouns ,  Joshua Adams ,  Aage Bendiksen ,  Richard Jacobs ,  Andrew Judge ,  Veera Venkata Narasimha Narendra Phani Kottapalli ,  Joseph Harry Lyons ,  Theodorus Marinus Modderman ,  Manish Ranjan ,  Marcus Adrianus Van De Kerkhof ,  Xugang Xiong

IPC: G03F7/20 ,  G03F7/00 ,  G03F1/62 ,  G03F1/64

CPC classification number: G03F7/7085 ,  G03F1/62 ,  G03F1/64 ,  G03F7/70033 ,  G03F7/70891 ,  G03F7/70983

Abstract: An apparatus for determining a condition associated with a pellicle for use in a lithographic apparatus, the apparatus including a sensor, wherein the sensor is configured to measure a property associated with the pellicle, the property being indicative of the pellicle condition.

公开(公告)号：US12158705B2

公开(公告)日：2024-12-03

申请号：US17909348

申请日：2021-03-01

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Joseph Harry Lyons ,  Jimi Hendriks ,  Ping Zhou ,  Zhuangxiong Huang ,  Reinier Theodorus Martinus Jilisen

IPC: G03F7/00

Abstract: Embodiments herein describe methods, devices, and systems for rupture detection and end-of-life monitoring of dynamic gas lock (DGL) membranes and pupil facet mirrors in lithographic apparatuses. A method for detecting rupture of a dynamic gas lock membrane in a lithographic apparatus includes illuminating the dynamic gas lock membrane with a measurement beam using a radiation source, in which the dynamic gas lock membrane is arranged between a wafer and projection optics of the lithography apparatus, and determining whether any radiation from the measurement beam is reflected from the dynamic gas lock membrane by using reflection collection optics, in which the reflection collection optics are arranged above the dynamic gas lock membrane. A rupture in the dynamic gas lock membrane is detected if no radiation is reflected from the dynamic gas lock membrane. If radiation is reflected from the dynamic gas lock membrane, the dynamic gas lock membrane is not ruptured.

公开(公告)号：US10429748B2

公开(公告)日：2019-10-01

申请号：US15576444

申请日：2016-06-06

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Joseph Harry Lyons ,  Martinus Cornelis Reijnen ,  Erik Johan Arlemark ,  Nicolae Marian Ungureanu ,  James Hamilton Walsh

IPC: G03F7/20 ,  G01B13/12 ,  G03F9/00

Abstract: An apparatus, such as a lithographic apparatus, has a metrology frame that has a reference frame mounted thereon that includes a reference surface. A gas gauge is movable relative to the reference frame, metrology frame, and a measured surface. A reference nozzle in the gas gauge provides gas to the reference surface and a measurement nozzle provides gas to the measured surface. A microelectromechanical (MEM) sensor may be used with the gas gauge to sense a difference in backpressure from each of the reference nozzle and the measurement nozzle. Optionally, multiple gas gauges are positioned in an array, which may extend in a direction that is substantially parallel to a plane of the measured surface. The gauges may be fluidly connected to a reference nozzle of the gas gauge. A channel may distribute gas across the array.