公开(公告)号：US20170363948A1

公开(公告)日：2017-12-21

申请号：US15537214

申请日：2015-12-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Cornelius Maria ROPS ,  Walter Theodorus Matheus STALS ,  David BESSEMS ,  Giovanni Luca GATTOBIGIO ,  Victor Manuel BLANCO CARBALLO ,  Erik Henricus Egidius Catharina EUMMELEN ,  Ronald VAN DER HAM ,  Frederik Antonius VAN DER ZANDEN ,  Wilhelmus Antonius WERNAART

IPC: G03B27/52 ,  G03F7/20

Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.

公开(公告)号：US20210088912A1

公开(公告)日：2021-03-25

申请号：US17112278

申请日：2020-12-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Cornelius Maria ROPS ,  Walter Theodorus Matheus STALS ,  David BESSEMS ,  Giovanni Luca GATTOBIGIO ,  Victor Manuel BLANCO CARBALLO ,  Erik Henricus Egidius Catharina EUMMELEN ,  Ronald VAN DER HAM ,  Frederik Antonius VAN DER ZANDEN ,  Wilhelmus Antonius WERNAART

IPC: G03F7/20 ,  B01D19/00 ,  G03B27/52

Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.

公开(公告)号：US20200166851A1

公开(公告)日：2020-05-28

申请号：US16778635

申请日：2020-01-31

Applicant: ASML Netherlands B.V.

Inventor： Cornelius Maria ROPS ,  Walter Theodorus Matheus STALS ,  David BESSEMS ,  Giovanni Luca GATTOBIGIO ,  Victor Manuel BLANCO CARBALLO ,  Erik Henricus Egidius Catharina EUMMELEN ,  Ronald VAN DER HAM ,  Frederik Antonius VAN DER ZANDEN ,  Wilhelmus Antonius WERNAART

IPC: G03F7/20 ,  B01D19/00 ,  G03B27/52

Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.