公开(公告)号：US11561480B2

公开(公告)日：2023-01-24

申请号：US16712397

申请日：2019-12-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Ivo Liebregts ,  Niladri Sen ,  Koen Thuijs ,  Ronaldus Johannes Gysbertus Goossens

IPC: G03F7/20

Abstract: A computer-implemented defect prediction method for a device manufacturing process involving processing a pattern onto a substrate. Non-correctable error is used to help predict locations where defects are likely to be present, allowing improvements in metrology throughput. In an embodiment, non-correctable error information relates to imaging error due to limitations on, for example, the lens hardware, imaging slit size, and/or other physical characteristics of the lithography system. In an embodiment, non-correctable error information relates to imaging error induced by lens heating effects.

公开(公告)号：US20200209761A1

公开(公告)日：2020-07-02

申请号：US16712397

申请日：2019-12-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Ivo LIEBREGTS ,  Niladri Sen ,  Koen Thuijs ,  Ronaldus Johannes Gysbertus Goossens

IPC: G03F7/20

Abstract: A computer-implemented defect prediction method for a device manufacturing process involving processing a pattern onto a substrate. Non-correctable error is used to help predict locations where defects are likely to be present, allowing improvements in metrology throughput. In an embodiment, non-correctable error information relates to imaging error due to limitations on, for example, the lens hardware, imaging slit size, and/or other physical characteristics of the lithography system. In an embodiment, non-correctable error information relates to imaging error induced by lens heating effects.