公开(公告)号：US20200294841A1

公开(公告)日：2020-09-17

申请号：US16650939

申请日：2018-09-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Niek Jacobus Johannes ROSET ,  Marcus Martinus Petrus Adrianus VERMEULEN ,  Simon Karel RAVENSBERGEN ,  Mark Constant Johannes BAGGEN ,  Gijs KRAMER ,  Roger Anton Marie TIMMERMANS ,  Frank Pieter Albert VAN DEN BERKMORTEL

IPC: H01L21/687 ,  G03F7/20

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.

公开(公告)号：US20230360954A1

公开(公告)日：2023-11-09

申请号：US18354227

申请日：2023-07-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Niek Jacobus Johannes ROSET ,  Marcus Martinus Petrus Adrianus VERMEULEN ,  Simon Karel RAVENSBERGEN ,  Mark Constant Johannes BAGGEN ,  Gijs KRAMER ,  Roger Anton Marie TIMMERMANS ,  Frank Pieter Albert VAN DEN BERKMORTEL

IPC: H01L21/687 ,  G03F7/00

CPC classification number: H01L21/6875 ,  G03F7/70341 ,  G03F7/707

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.

公开(公告)号：US20250031294A1

公开(公告)日：2025-01-23

申请号：US18716468

申请日：2022-12-07

Applicant: ASML Netherlands B.V.

Inventor： Roger Anton Marie TIMMERMANS ,  Alexander Evgenevich LINKOV ,  Bas Willem Johannes Johanna Anna VAN DORP ,  Thomas William Georg KHOURI ,  Paul Peter Anna Antonius BROM

IPC: H05G2/00 ,  G01B11/27 ,  G02B5/00 ,  G03F7/00

Abstract: An aperture for detecting a laser beam misalignment, the aperture comprising: a body including a first opening and defining a first axis; a beam dump; an optical element including a second opening wherein the first opening and the second opening are coaxial with the first axis, the optical element being configured to redirect a misaligned laser beam to a detector or to split a misaligned laser beam into at least two sub-beams; a laser beam detection system configured to detect laser light, wherein the optical element is configured to direct a first sub-beam to the beam dump, and to direct a second sub-beam to the laser beam detection system. Also described is an aperture including an enclosure, a method of detecting misalignment of a laser beam, a radiation source comprising such an aperture, a lithographic apparatus comprising such a radiation source or aperture, and the use of the same in a lithographic apparatus or method.

公开(公告)号：US20160349628A1

公开(公告)日：2016-12-01

申请号：US15235542

申请日：2016-08-12

Applicant: ASML Netherlands B.V.

Inventor： Arno Jan BLEEKER ,  Thomas Josephus Maria CASTENMILLER ,  Pieter Willem Herman DEJAGER ,  Heine Melle MULDER ,  Koen Jacobus Johannes ZAAL ,  Theodorus Petrus Maria CADEE ,  Danny Maria Hubertus PHILIPS ,  Ruud Antonius Catharina Maria BEERENS ,  Roger Anton Marie TIMMERMANS

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/20 ,  G03F7/7005 ,  G03F7/70075 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70366 ,  G03F7/70383 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70425 ,  G03F7/70475

Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction.

Abstract translation: 配置成将辐射束投影到目标上的投影系统包括可旋转框架，其被配置为围绕限定切线方向和径向方向的轴线旋转，其中可旋转框架保持配置成将辐射束聚焦在仅切向 或径向; 以及固定部分，其包括基本上固定的透镜，其被配置为仅将所述辐射束聚焦在所述切向或径向方向中的另一个中。