公开(公告)号：US20180239267A1

公开(公告)日：2018-08-23

申请号：US15752658

申请日：2016-08-23

申请人： ASML NETHERLANDS B.V.

发明人： Rene Marinus Gerardus Johan QUEENS ,  Arend Johannes DONKERBROEK ,  Pietro ANDRICCIOLA ,  Ewoud Frank VAN WEST

IPC分类号： G03F9/00

CPC分类号： G03F9/7026 ,  G03F9/7019 ,  G03F9/7034 ,  G03F9/7049 ,  G03F9/7057 ,  G03F9/7088 ,  G03F9/7092

摘要： A lithographic apparatus uses a height sensor to obtain height sensor data representing a topographical variation across a substrate. The height sensor data is used to control focusing of a device pattern at multiple locations across the substrate. A controller identifies one or more first areas where height sensor data is judged to be reliable and one or more second areas where the height sensor data is judged to be less reliable. Substitute height data is calculated for the second areas using height sensor data for the first areas together with prior knowledge of expected device-specific topography. The focusing of the lithographic apparatus is controlled using a combination of the height data from the sensor and the substitute height data.