公开(公告)号：US20240111214A1

公开(公告)日：2024-04-04

申请号：US18274990

申请日：2021-12-20

Applicant: ASML Netherlands B.V.

Inventor： Jacob Fredrik Friso KLINKHAMER ,  Michel Alphons Theodorus VAN HINSBERG

IPC: G03F7/20

CPC classification number: G03F7/20

Abstract: A method for representing control parameter data for controlling a lithographic apparatus during a scanning exposure of an exposure field on a substrate, the method including: obtaining a set of periodic base functions, each base function out of the set of periodic base functions having a different frequency and a period smaller than a dimension associated with the exposure field across which the lithographic apparatus needs to be controlled; obtaining the control parameter data; and determining a representation of the control parameter data using the set of periodic base functions.

公开(公告)号：US20220413391A1

公开(公告)日：2022-12-29

申请号：US17777348

申请日：2020-10-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Michel Alphons Theodorus VAN HINSBERG ,  James Robert DOWNES ,  Erwin Josef Maria VERDURMEN ,  Jacob Fredrik Friso KLINKHAMER ,  Roy WERKMAN ,  Jochem Sebastiaan WILDENBERG ,  Adam Jan URBANCZYK ,  Lucas Jan Joppe VISSER

IPC: G03F7/20

Abstract: A method for determining an input to a lens model to determine a setpoint for manipulation of a lens of a lithographic apparatus when addressing at least one of a plurality of fields of a substrate, the method including: receiving parameter data for the at least one field, the parameter data relating to one or more parameters of the substrate within the at least one field, the one or more parameters being at least partially sensitive to manipulation of the lens as part of an exposure performed by the lithographic apparatus; receiving lens model data relating to the lens; and determining the input based on the parameter data and on the lens model data.