公开(公告)号：US20240111214A1

公开(公告)日：2024-04-04

申请号：US18274990

申请日：2021-12-20

Applicant: ASML Netherlands B.V.

Inventor： Jacob Fredrik Friso KLINKHAMER ,  Michel Alphons Theodorus VAN HINSBERG

IPC: G03F7/20

CPC classification number: G03F7/20

Abstract: A method for representing control parameter data for controlling a lithographic apparatus during a scanning exposure of an exposure field on a substrate, the method including: obtaining a set of periodic base functions, each base function out of the set of periodic base functions having a different frequency and a period smaller than a dimension associated with the exposure field across which the lithographic apparatus needs to be controlled; obtaining the control parameter data; and determining a representation of the control parameter data using the set of periodic base functions.

公开(公告)号：US20220413391A1

公开(公告)日：2022-12-29

申请号：US17777348

申请日：2020-10-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Michel Alphons Theodorus VAN HINSBERG ,  James Robert DOWNES ,  Erwin Josef Maria VERDURMEN ,  Jacob Fredrik Friso KLINKHAMER ,  Roy WERKMAN ,  Jochem Sebastiaan WILDENBERG ,  Adam Jan URBANCZYK ,  Lucas Jan Joppe VISSER

IPC: G03F7/20

Abstract: A method for determining an input to a lens model to determine a setpoint for manipulation of a lens of a lithographic apparatus when addressing at least one of a plurality of fields of a substrate, the method including: receiving parameter data for the at least one field, the parameter data relating to one or more parameters of the substrate within the at least one field, the one or more parameters being at least partially sensitive to manipulation of the lens as part of an exposure performed by the lithographic apparatus; receiving lens model data relating to the lens; and determining the input based on the parameter data and on the lens model data.

公开(公告)号：US20210208519A1

公开(公告)日：2021-07-08

申请号：US17057619

申请日：2019-05-02

Applicant: ASML Netherlands B.V.

Inventor： Jia WANG ,  Jacob Fredrik Friso KLINKHAMER ,  Hua LI

IPC: G03F9/00

Abstract: Disclosed is a bandwidth calculation system for determining a desired wavelength bandwidth for a measurement beam in a mark detection system, the bandwidth calculation system comprising a processing unit configured to determine the desired wavelength bandwidth based on mark geometry information, e.g. comprising mark depth information representing a depth of a mark. In an embodiment the desired wavelength bandwidth is based on a period and/or a variance parameter of a mark detection error function. The invention further relates to a mark detection system, a position measurement system and a lithographic apparatus comprising the bandwidth calculation system, as well as a method for determining a desired wavelength bandwidth.

公开(公告)号：US20220334499A1

公开(公告)日：2022-10-20

申请号：US17639631

申请日：2020-08-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Jacob Fredrik Friso KLINKHAMER ,  Valerio ALTINI ,  Hans Erik KATTOUW ,  Theo Wilhelmus Maria THIJSSEN

IPC: G03F7/20

Abstract: A method for determining a correction for control of a lithographic process for exposing a pattern on an exposure field using a lithographic apparatus. The method including obtaining a spatial profile describing spatial variation of a performance parameter across at least a portion of the exposure field and co-determining control profiles for the spatial profile to minimize error in the performance parameter while ensuring a minimum contrast quality. The co-determined control profiles include at least a stage control profile for control of a stage arrangement of the lithographic apparatus and an optical element (e.g., lens) manipulator control profile for control of an optical element manipulator of the lithographic apparatus, the manipulator operable to perform a correction for at least magnification in a direction perpendicular to the substrate plane.