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公开(公告)号:US11126092B2
公开(公告)日:2021-09-21
申请号:US15774583
申请日:2016-10-07
Applicant: ASML NETHERLANDS B.V.
Inventor: Lin Lee Cheong , Wenjin Huang , Bruno La Fontaine
IPC: G03F7/20 , G05B19/4097
Abstract: A method including: determining a value of a characteristic of a patterning process or a product thereof, at a current value of a processing parameter; determining whether a termination criterion is met by the value of the characteristic; if the termination criterion is not met, determining a new value of the processing parameter from the current value of the processing parameter and a prior value of the processing parameter, and setting the current value to the new value and repeating the determining steps; and if the termination criterion is met, providing the current value of the processing parameter as an approximation of a value of the processing parameter at which the characteristic has a target value.
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公开(公告)号:US11443083B2
公开(公告)日:2022-09-13
申请号:US16300380
申请日:2017-04-20
Applicant: ASML NETHERLANDS B.V.
Inventor: Jing Su , Yi Zou , Chenxi Lin , Stefan Hunsche , Marinus Jochemsen , Yen-Wen Lu , Lin Lee Cheong
Abstract: Methods of identifying a hot spot from a design layout or of predicting whether a pattern in a design layout is defective, using a machine learning model. An example method disclosed herein includes obtaining sets of one or more characteristics of performance of hot spots, respectively, under a plurality of process conditions, respectively, in a device manufacturing process; determining, for each of the process conditions, for each of the hot spots, based on the one or more characteristics under that process condition, whether that hot spot is defective; obtaining a characteristic of each of the process conditions; obtaining a characteristic of each of the hot spots; and training a machine learning model using a training set including the characteristic of one of the process conditions, the characteristic of one of the hot spots, and whether that hot spot is defective under that process condition.
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公开(公告)号:US20220277116A1
公开(公告)日:2022-09-01
申请号:US17744091
申请日:2022-05-13
Applicant: ASML NETHERLANDS B.V.
Inventor: Jing SU , Yi Zou , Chenxi Lin , Stefan Hunsche , Marinus Jochemsen , Yen-Wen Lu , Lin Lee Cheong
Abstract: Methods of identifying a hot spot from a design layout or of predicting whether a pattern in a design layout is defective, using a machine learning model. An example method disclosed herein includes obtaining sets of one or more characteristics of performance of hot spots, respectively, under a plurality of process conditions, respectively, in a device manufacturing process; determining, for each of the process conditions, for each of the hot spots, based on the one or more characteristics under that process condition, whether that hot spot is defective; obtaining a characteristic of each of the process conditions; obtaining a characteristic of each of the hot spots; and training a machine learning model using a training set including the characteristic of one of the process conditions, the characteristic of one of the hot spots, and whether that hot spot is defective under that process condition.
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