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公开(公告)号：US20150062548A1
公开(公告)日：2015-03-05
申请号：US14382230
申请日：2013-02-21
CPC分类号： G03F7/7055 , G01J1/0488 , G01J1/429 , G03F7/70558 , G03F7/7085 , G03F7/70958
摘要： A lithographic apparatus comprises an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a sensor. The sensor (S) comprises a photodiode (2) provided on a face (8) of a semiconductor substrate (4) towards which the radiation beam is directed during operation of the lithographic apparatus, a first radiation blocking material (10) being provided around the photodiode on the face of the semiconductor substrate, and a second radiation blocking material (12) is provided on a side (14) of the semiconductor substrate upon which the radiation beam is incident during operation of the lithographic apparatus.
摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统，构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台，配置成将图案化的辐射束投影到基板的目标部分上的投影系统和传感器。 传感器（S）包括设置在半导体衬底（4）的面（8）上的光电二极管（2），辐射束在光刻设备的操作期间朝向该光电二极管（8），第一辐射阻挡材料（10）围绕 半导体衬底的表面上的光电二极管和第二辐射阻挡材料（12）设置在半导体衬底的侧面（14）处，在光刻设备的操作期间辐射束入射。
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公开(公告)号：US11143968B2
公开(公告)日：2021-10-12
申请号：US15196120
申请日：2016-06-29
发明人： Daniel Jozef Maria Direcks , Sjoerd Nicolaas Lambertus Donders , Nicolaas Rudolf Kemper , Danny Maria Hubertus Philips , Michel Riepen , Clemens Johannes Gerardus Van Den Dungen , Adrianes Johannes Baeten , Fabrizio Evangelista
IPC分类号： G03F7/20
摘要： A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.
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公开(公告)号：US09470985B2
公开(公告)日：2016-10-18
申请号：US14382230
申请日：2013-02-21
CPC分类号： G03F7/7055 , G01J1/0488 , G01J1/429 , G03F7/70558 , G03F7/7085 , G03F7/70958
摘要： A lithographic apparatus comprises an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a sensor. The sensor (S) comprises a photodiode (2) provided on a face (8) of a semiconductor substrate (4) towards which the radiation beam is directed during operation of the lithographic apparatus, a first radiation blocking material (10) being provided around the photodiode on the face of the semiconductor substrate, and a second radiation blocking material (12) is provided on a side (14) of the semiconductor substrate upon which the radiation beam is incident during operation of the lithographic apparatus.
摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统，构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台，配置成将图案化的辐射束投影到基板的目标部分上的投影系统和传感器。 传感器（S）包括设置在半导体衬底（4）的面（8）上的光电二极管（2），辐射束在光刻设备的操作期间朝向该光电二极管（8），第一辐射阻挡材料（10）围绕 半导体衬底的表面上的光电二极管和第二辐射阻挡材料（12）设置在半导体衬底的侧面（14）处，在光刻设备的操作期间辐射束入射。
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公开(公告)号：US20190285990A1
公开(公告)日：2019-09-19
申请号：US16277120
申请日：2019-02-15
发明人： Rogier Hendrikus Magdelena Cortie , Paulus Martinus Maria Liebregts , Michel Riepen , Fabrizio Evangelista
IPC分类号： G03F7/20
摘要： A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.
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公开(公告)号：US10209624B2
公开(公告)日：2019-02-19
申请号：US15838634
申请日：2017-12-12
发明人： Rogier Hendrikus Magdalena Cortie , Paulus Martinus Maria Liebregts , Michel Riepen , Fabrizio Evangelista
IPC分类号： G03F7/20
摘要： A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.
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公开(公告)号：US09846372B2
公开(公告)日：2017-12-19
申请号：US15016041
申请日：2016-02-04
发明人： Rogier Hendrikus Magdalena Cortie , Paulus Martinus Maria Liebregts , Michel Riepen , Fabrizio Evangelista
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.
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