公开(公告)号：US20150380299A1

公开(公告)日：2015-12-31

申请号：US14768423

申请日：2014-02-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Jozef Maria FINDERS ,  Sander Frederik WUISTER ,  Eddy Cornelis Antonius VAN DER HEIJDEN ,  Henri Marie Joseph BOOTS

IPC: H01L21/768 ,  G03F7/20 ,  H01L21/3105 ,  H01L21/268 ,  H01L21/02 ,  H01L21/311

CPC classification number: H01L21/76816 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/2002 ,  G03F7/2004 ,  H01L21/02345 ,  H01L21/268 ,  H01L21/31058 ,  H01L21/31133

Abstract: A method of forming a plurality of regularly spaced lithography features, e.g. contact holes, including: providing a trench on a substrate, the trench having opposing side-walls and a base, with the side-walls having a width therebetween, wherein the trench is formed by photolithography including exposing the substrate using off-axis illumination whereby a modulation is provided to the side-walls of the trench; providing a self-assemblable block copolymer having first and second blocks in the trench; causing the self-assemblable block copolymer to self-assemble into an ordered layer in the trench, the layer having first domains of the first block and second domains of the second block; and selectively removing the first domain to form at least one regularly spaced row of lithography features having the second domain along the trench.

Abstract translation: 一种形成多个规则间隔的光刻特征的方法，例如。 接触孔，包括：在衬底上提供沟槽，所述沟槽具有相对的侧壁和底座，其中所述侧壁之间具有宽度，其中所述沟槽通过光刻形成，包括使用离轴照明曝光所述衬底，由此 向沟槽的侧壁提供调制; 提供在沟槽中具有第一和第二嵌段的自组装嵌段共聚物; 使自组装嵌段共聚物自组装成沟槽中的有序层，该层具有第一嵌段的第一区域和第二嵌段的第二区域; 以及选择性地移除所述第一区域以形成沿着所述沟槽具有所述第二结构域的至少一个规则间隔的光刻特征行。