公开(公告)号：US20210080834A1

公开(公告)日：2021-03-18

申请号：US17050264

申请日：2019-03-18

Applicant: ASML Netherlands B.V.

Inventor： Hans BUTLER ,  Joep Sander DE BEER ,  Cornelius Adrianus Lambertus DE HOON ,  Jeroen Pieter STARREVELD ,  Martinus VAN DUIJNHOVEN ,  Maurice Willem Jozef Etiënn WIJCKMANS

IPC: G03F7/20

Abstract: The invention provides a pneumatic support device for a lithographic apparatus and a lithographic apparatus with such support device. The support device comprises a gas spring. The gas spring comprises a suspending part, a suspended part, and a pressure chamber configured for supporting the suspended part relative to the suspending part. The support device further comprises an actuator configured for positioning the suspended part relative to the suspending part, an acceleration sensor configured for generating a first sensor signal representative for the acceleration of the suspending part, a pressure sensor configured for generating a second sensor signal representative for the pressure in the pressure chamber, and a control unit. The control unit is configured to: receive the first sensor signal, receive the second sensor signal, filter the first sensor signal in a low-pass filter, filter the second sensor signal in a high-pass filter, determine, based on the filtered first sensor signal and filtered second sensor signal, a force exerted by the suspending part on the suspended part, and generate, based on said force, a control signal for the actuator.

公开(公告)号：US20220113636A1

公开(公告)日：2022-04-14

申请号：US17428223

申请日：2020-01-03

Applicant: ASML Netherlands B.V.

Inventor： Hans BUTLER ,  Bas JANSEN ,  Cornelius Adrianus Lambertus DE HOON

IPC: G03F7/20 ,  G01D3/032 ,  G01P15/09

Abstract: The invention relates to an electronic system for an accelerometer having a piezoelectric element and a first mechanical resonance frequency, comprising: a) a damping circuit configured to: —receive an acceleration signal from the piezoelectric element; —electronically dampen an amplitude of the first mechanical resonance frequency; and—generate a damped acceleration signal, b) an extender configured to: —receive the damped acceleration signal; —extend the frequency response; and—output an extended damped acceleration signal, wherein the extender is configured to have a first electronic anti-resonance frequency matching the damped first mechanical resonance frequency, and to have a frequency response between the first electronic anti-resonance frequency and a higher second frequency that is substantially opposite to a corresponding frequency response of the combination of the accelerometer and the damping circuit.

公开(公告)号：US20180373156A1

公开(公告)日：2018-12-27

申请号：US16062735

申请日：2016-11-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans BUTLER ,  Björn Hubertus Maria BUKKEMS ,  Cornelius Adrianus Lambertus DE HOON ,  Maurice Willem Jozef Etiënne WIJCKMANS

IPC: G03F7/20

CPC classification number: G03F7/709 ,  G03F7/70758 ,  G03F7/70775 ,  G03F7/70825 ,  G03F7/70833

Abstract: A lithographic apparatus comprises a base frame constructed to form a supporting structure of the lithographic apparatus, an active base frame support arranged between the base frame and a ground floor. The active base frame support is configured to support the base frame on the ground floor. The active base frame support comprises an actuator configured to exert a force in a horizontal direction between the base frame and the ground plane. The lithographic apparatus further comprises a control device configured to drive the actuator, a signal representative of a disturbance force on the base frame being provided to the control device, the control device being configured to drive the actuator using the force sensor signal.

公开(公告)号：US20160238953A1

公开(公告)日：2016-08-18

申请号：US15027986

申请日：2014-10-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans BUTLER ,  Cornelius Adrianus Lambertus DE HOON ,  Marc Wilhelmus Maria VAN DER WIJST ,  Thijs VERHEES ,  Sander KERSSEMAKERS

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70766 ,  G03F7/70833 ,  G03F7/709

Abstract: A lithographic apparatus includes a base frame, an illumination system configured to condition a radiation beam and supported by the base frame, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a positioning device configured to position the substrate table, the positioning device being supported by the base frame, a sensor configured to sense a vibration caused by a torque exerted on the base frame, and an actuator configured to exert a force on the illumination system or the base frame, in response to the sensed vibration, in order to at least partly dampen the vibration.

Abstract translation: 光刻设备包括基架，照明系统，其配置为调节辐射束并由基架支撑，支撑结构以支撑图案形成装置，所述图案形成装置能够将辐射束赋予其横截面图案， 形成图案化的辐射束，构造成保持衬底的衬底台，配置成将图案化的辐射束投影到衬底的目标部分上的投影系统，配置成定位衬底台的定位装置，定位装置被支撑 通过基架，传感器被配置为感测由施加在基架上的扭矩引起的振动;以及致动器，其被配置为响应于感测到的振动而对照明系统或基架施加力，以致于 至少部分抑制振动。

公开(公告)号：US20210240090A1

公开(公告)日：2021-08-05

申请号：US17049719

申请日：2019-04-04

Applicant: ASML Netherlands B.V.

Inventor： Hans BUTLER ,  Joep Sander DE BEER ,  Cornelius Adrianus Lambertus DE HOON ,  Jeroen Pieter STARREVELD ,  Martinus VAN DUIJNHOVEN ,  Maurice Willem Jozef Etiënn WIJCKMANS

IPC: G03F7/20

Abstract: A lithographic apparatus or frame assembly, comprising: a first and second pneumatic support, being arranged to control position of a frame, each of said pneumatic supports accommodating a pressure chamber; a frame position control system, comprising; a first position sensor device, configured to generate measurement data relating to the position of the frame; a first pressure controller, configured to control the pressure in the pressure chamber of the first pneumatic support on the basis of the measurement data generated by the first position sensor device; a pressure differential sensor device, configured to generate data relating to the difference between the pressure in the pressure chambers of the first and the second pneumatic support; a second pressure controller, configured to control the pressure in the pressure chamber of the second pneumatic support on the basis of the measurement data from the pressure differential sensor device.

公开(公告)号：US20180101099A1

公开(公告)日：2018-04-12

申请号：US15567103

申请日：2016-03-08

Applicant: ASML Netherlands B.V.

Inventor： Günes NAKIBOGLU ,  Marc Wilhelmus Maria VAN DER WIJST ,  Martinus VAN DUIJNHOVEN ,  Cornelius Adrianus Lambertus DE HOON ,  Frank Johannes Jacobus VAN BOXTEL

IPC: G03F7/20

CPC classification number: G03F7/20 ,  G03F7/709

Abstract: A lithographic apparatus has shield which protects a functional subsystem form acoustic disturbances. The shield comprises a locally resonant sonic material for implementing the protecting. In an embodiment the shield comprises a panel formed by a cell or a plurality of cells comprising: a frame; an elastic membrane whose edge is fixed to the frame; and a mass attached to a location at the membrane at a non-zero distance from the edge.

公开(公告)号：US20160334718A1

公开(公告)日：2016-11-17

申请号：US15109427

申请日：2014-12-18

Applicant: ASML Netherlands B.V.

Inventor： Hans BUTLER ,  Cornelius Adrianus Lambertus DE HOON ,  INgmar August KERP ,  Pieter Johannes Gertrudis MEIJERS ,  Jeroen Pieter STARREVELD ,  Derk TEN HOOPEN ,  Martinus VAN DUIJNHOVEN ,  Edward HAGE ,  Evert Hendrik Jan DRAAIJER ,  Wesley OOMS

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  F16F15/0232 ,  G03F7/70733 ,  G03F7/70833 ,  G03F7/709

Abstract: A support device configured to support a first part relative to a second part, minimizing the transfer of vibration between the two parts, includes a supporting system configured to use gas under pressure to provide a support force between the first and second parts; a gas chamber connected to the supporting system and configured to contain the gas under pressure and provide the gas under pressure to the supporting system; and a section of acoustic damping material, arranged at a location within the gas chamber so as to separate a first gas containing region and a second gas containing region within the gas chamber, wherein the section of acoustic damping material has a first side and a second side, wherein the first gas containing region is on the first side and the second gas containing region is on the second side.

Abstract translation: 支撑装置，被配置为相对于第二部分支撑第一部分，最小化两个部分之间的振动传递，包括构造成在压力下使用气体以在第一和第二部分之间提供支撑力的支撑系统; 连接到支撑系统并被配置为容纳处于压力下的气体并将气体提供给支撑系统的气体室; 以及一部分声阻尼材料，其布置在所述气体室内的位置处，以分离所述气体室内的第一气体容纳区域和第二气体容纳区域，其中所述声学阻尼材料部分具有第一侧面和第二侧面 其中所述第一气体容纳区域在所述第一侧上且所述第二气体容纳区域位于所述第二侧。

公开(公告)号：US20210080835A1

公开(公告)日：2021-03-18

申请号：US17053021

申请日：2019-04-23

Applicant: ASML Netherlands B.V.

Inventor： Roy Hendrikus Emilie Maria JACOBS ,  Cornelius Adrianus Lambertus DE HOON ,  Jeroen Pieter STARREVELD ,  Johannes Petrus Martinus Ber VERMEULEN

IPC: G03F7/20 ,  F16F13/00 ,  F16F15/04 ,  F16F15/023

Abstract: The invention provides a vibration isolation system (IS), comprising a piston (402) to carry a payload, a connecting member (410), a spring (404) and a flexible member (408). The spring is arranged to support the piston along a direction with a positive stiffness. The flexible member is arranged to apply a force to the piston along the direction via the connecting member with a negative stiffness.

公开(公告)号：US20190129317A1

公开(公告)日：2019-05-02

申请号：US16219449

申请日：2018-12-13

Applicant: ASML Netherlands B.V.

Inventor： Michael RONDE ,  Lucas KUINDERSMA ,  Niels BOSCH ,  Hans BUTLER ,  Cornelius Adrianus Lambertus DE HOON ,  Marc Wilhelmus Maria VAN DER WIJST ,  Thijs VERHEES ,  Sander KERSSEMAKERS

IPC: G03F7/20

Abstract: An apparatus having: a system configured to measure an object; a base structure; an object support constructed to hold the object, the object support movably supported on the base structure; a balance mass configured to absorb a reaction force arising from movement of the object support; an actuator connected to the balance mass and the base structure, the actuator configured to apply a force to the balance mass and the base structure; a sensor configured to produce a signal for a measured characteristic of the base structure corresponding to a disturbance, or its effect, acting on the base structure; and a control system configured to determine, based on at least the signal for the measured characteristic of the base structure, a signal for the actuator to apply a force to the base structure and/or the balance mass.

公开(公告)号：US20190011838A1

公开(公告)日：2019-01-10

申请号：US16068211

申请日：2016-12-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans BUTLER ,  Cornelius Adrianus Lambertus DE HOON ,  Fransiscus Mathijs JACOBS ,  Pavel KAGAN ,  Jeroen Pieter STARREVELD ,  Maurice Willem Jozef Etiënne WIJCKMANS

IPC: G03F7/20

Abstract: A lithographic apparatus is described, the lithographic apparatus comprising: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a projection system configured to project the patterned radiation beam onto a target portion of a substrate, a stage assembly comprising: a substrate table constructed to hold the substrate; and a positioning device configured to displace the substrate table relative to the projection system; a base frame onto which stage assembly and the projection system are mounted; the base frame comprising a first portion configured to support the stage assembly and a second portion configured to support the projection system, the first portion and the second portion being connected to each other via a compliant portion of the base frame.