公开(公告)号：US11126007B2

公开(公告)日：2021-09-21

申请号：US16913698

申请日：2020-06-26

Applicant: ASML Holding N.V.

Inventor： Douglas C. Cappelli ,  Stanislav Smirnov ,  Richard Carl Zimmerman ,  Joshua Adams ,  Alexander Kenneth Raub ,  Yevgeniy Konstantinovich Shmarev

IPC: G03F7/20 ,  G02B27/28 ,  G01N21/47 ,  G01N21/956

Abstract: According to one embodiment, a prism system is provided. The prism system includes a polarizing beam splitter (PBS) surface. The PBS surface is configured to generate first and second sub-beams having corresponding first and second polarization information from a received beam, the second polarization information being different than the first polarization information. A first optical path of the first sub-beam within the prism system has substantially same length as a second optical path of the second sub-beam within the prism system. Additionally or alternatively, the first sub-beam achieves a predetermined polarization extinction ratio.

公开(公告)号：US12292697B2

公开(公告)日：2025-05-06

申请号：US17614159

申请日：2020-05-19

Applicant: ASML HOLDING N.V.

Inventor： Douglas C. Cappelli

IPC: G03F9/00 ,  G01B9/02097

Abstract: A self-referencing interferometer (SRI) system for an alignment sensor apparatus includes a first prism and a second prism. The first prism has an input surface for an incident beam. The second prism is coupled to the first prism and has an output surface for a recombined beam. The recombined beam includes a first image and a second image rotated by 180 degrees with respect to the first image. The first and second prisms are identical in shape. A dual self-referencing interferometer (DSRI) system for an alignment sensor apparatus includes a first prism assembly having an input surface for a first incident beam and a second incident beam, and a second prism assembly coupled to the first prism assembly and having an output surface for a first recombined beam and a second recombined beam. The first and second prism assemblies are identical in shape.

公开(公告)号：US12287585B2

公开(公告)日：2025-04-29

申请号：US18033530

申请日：2021-10-14

Applicant: ASML Holding N.V.

Inventor： Douglas C. Cappelli

IPC: G03F7/00

Abstract: An inspection system, a lithographic apparatus, and a method are provided. The inspection system includes an illumination system, an optical system, a shutter system, an objective system and a detector. The illumination system is configured to generate an illumination beam. The optical system is configured to split the illumination beam into a first sub-beam and a second sub-beam. The shutter system is configured to independently control a transmittance of the first sub-beam and the second subbeam. The objective system is configured to receive the first sub-beam and the second beam from the optical system and direct the first sub-beam and the second sub-beam towards a substrate having a target structure. The detector is configured to receive an image or a diffracted image of the target structure.

公开(公告)号：US10747010B2

公开(公告)日：2020-08-18

申请号：US16217424

申请日：2018-12-12

Applicant: ASML Holding N.V.

Inventor： Douglas C. Cappelli ,  Stanislav Smirnov ,  Richard Carl Zimmerman ,  Joshua Adams ,  Alexander Kenneth Raub ,  Yevgeniy Konstantinovich Shmarev

IPC: G01N21/956 ,  G03F7/20 ,  G02B27/28 ,  G01N21/47

Abstract: According to one embodiment, a prism system is provided. The prism system includes a polarizing beam splitter (PBS) surface. The PBS surface is configured to generate first and second sub-beams having corresponding first and second polarization information from a received beam, the second polarization information being different than the first polarization information. A first optical path of the first sub-beam within the prism system has substantially same length as a second optical path of the second sub-beam within the prism system. Additionally or alternatively, the first sub-beam achieves a predetermined polarization extinction ratio.