公开(公告)号：US20030192478A1

公开(公告)日：2003-10-16

申请号：US10412822

申请日：2003-04-11

Applicant: ASM JAPAN K.K.

Inventor： Naoto Tsuji ,  Ryo Kawaguchi ,  Atsuki Fukazawa ,  Rei Tanaka

IPC: C23C016/00

CPC classification number: H01J37/32082 ,  C23C16/4582 ,  C23C16/4585 ,  C23C16/5096 ,  H01L21/68735

Abstract: A plasma CVD apparatus includes a vacuum chamber, a showerhead, and a susceptor characterized in that an insulation ring is placed and embedded in a peripheral portion of the susceptor to increase the electrically effective distance between the showerhead and the susceptor, both of which functions as electrodes.

Abstract translation: 等离子体CVD装置包括真空室，喷头和基座，其特征在于，绝缘环被放置并嵌入在所述基座的周边部分中，以增加所述喷头和所述基座之间的电有效距离， 电极。