公开(公告)号：US20030130409A1

公开(公告)日：2003-07-10

申请号：US10316877

申请日：2002-12-12

Applicant: ASAHI GLASS COMPANY LIMITED

Inventor： Isamu Kaneko ,  Shinji Okada ,  Yasuhide Kawaguchi ,  Yoko Takebe ,  Shun-Ichi Kodama

IPC: C08K003/00

CPC classification number: G03F7/0395 ,  C08L27/12 ,  C08L29/14 ,  G03F7/0046 ,  G03F7/0392 ,  Y10S430/106 ,  Y10S430/108 ,  C08L2666/04

Abstract: The following resist composition of chemical amplification type, which is excellent in transparency to light beams and dry etching properties and gives a resist pattern excellent in sensitivity, resolution, evenness, heat resistance, etc. A resist composition which comprises a fluoropolymer (A) comprising monomer units (a) of a fluorovinyl monomer having nullCF2nullOR (wherein R is a C1-10 alkyl group) and monomer units (b) of an alicyclic ethylenic monomer, an acid-generating compound (B) which generates an acid upon irradiation with light, and an organic solvent (C).

Abstract translation: 化学放大型的抗蚀剂组合物，其光透射性和干蚀刻性能优异，并且提供了灵敏度，分辨率，均匀度，耐热性等优异的抗蚀剂图案。一种抗蚀剂组合物，其包含含氟聚合物（A），其包含 具有-CF2-OR（其中R是C1-10烷基）的氟乙烯基单体的单体单元（a）和脂环族烯属单体的单体单元（b），产生酸的产酸化合物（B） 用光照射，和有机溶剂（C）。

公开(公告)号：US20040033439A1

公开(公告)日：2004-02-19

申请号：US10635514

申请日：2003-08-07

Applicant: ASAHI GLASS COMPANY LIMITED

Inventor： Isamu Kaneko ,  Shinji Okada ,  Yasuhide Kawaguchi ,  Yoko Takebe ,  Shun-Ichi Kodama

IPC: B05D003/06 ,  G03C001/492

CPC classification number: G03F7/0392 ,  G03F7/0046 ,  G03F7/0395 ,  Y10S430/114 ,  Y10S430/146 ,  Y10T428/3154

Abstract: To provide a chemical amplification type resist composition which is excellent in transparency to a radiation and in dry etching properties and which gives a resist pattern excellent in sensitivity, resolution, evenness, heat resistance, etc. A resist composition comprising a fluoropolymer (A) which is a fluoropolymer having repeating units formed by cyclopolymerization of a fluorinated diene represented by the formula (1) and which has blocked acidic groups as Q, an acid-generating compound (B) which generates an acid under irradiation with light, and an organic solvent (C):CF2nullCR1nullQnullCR2nullCH2nullnull(1)wherein each of R1 and R2 which are independent of each other, is a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group, and Q is a bivalent organic group having a blocked acidic group capable of forming an acidic group by an acid or a group which can be converted to such a blocked acidic group.

Abstract translation: 提供一种透光性和干蚀刻性能优异的化学放大型抗蚀剂组合物，其具有优异的灵敏度，分辨率，均匀性，耐热性等的抗蚀剂图案。一种抗蚀剂组合物，其包含含氟聚合物（A） 是具有由式（1）表示的氟化二烯和阻聚酸性基团Q的重复单元形成的重复单元，在光照下产生酸的产酸化合物（B）和有机溶剂 （C）：CF 2 = CR 1 -Q-CR 2 = CH 2（1）其中彼此独立的R 1和R 2各自为氢原子，氟原子， 甲基或三氟甲基，Q是具有可以通过酸或能够转化为这种封闭的酸性基团的基团形成酸性基团的封端酸性基团的二价有机基团。

公开(公告)号：US20040013970A1

公开(公告)日：2004-01-22

申请号：US10376243

申请日：2003-03-03

Applicant: Asahi Glass Company, Limited

Inventor： Shinji Okada ,  Yasuhide Kawaguchi ,  Yoko Takebe ,  Isamu Kaneko ,  Shun-ichi Kodama

IPC: G03F007/039

CPC classification number: G03F7/0046 ,  G03F7/0395 ,  Y10S430/115 ,  Y10S430/146

Abstract: A resist composition comprising the following fluoropolymer (A), an acid-generating compound (B) which generates an acid under irradiation with light and an organic solvent (C): Fluoropolymer (A): a fluoropolymer having blocked acidic groups, which is a fluoropolymer having monomeric units formed by cyclopolymerization of a fluorinated diene of the formula (1) and monomeric units formed by polymerization of an acrylic monomer of the formula (2) and which is, when a copolymer obtained by polymerizing the fluorinated diene of the formula (1) and the acrylic monomer of the formula (2), has no blocked acidic groups, obtained by forming blocked acidic groups in the copolymer: CF2nullCR1-Q-CR2nullCH2nullnull(1) wherein each of R1 and R2 which are independent of each other, is a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group, and Q is a bivalent organic group which is a blocked acidic group capable of forming an acidic group by an acid, an acidic group, or a group which can be converted to a blocked acidic group and which is other than an acidic group; CH2nullCR3nullCO2R4nullnull(2) wherein R3 is a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group, and R4 is a hydrogen atom, a hydrocarbon group, an organic group having an acidic group, an organic group having a blocked acidic group capable of forming an acidic group by an acid, or an organic group having a group which can be converted to a blocked acidic group and which is other than an acidic group.

Abstract translation: 包含以下含氟聚合物（A），在光照射下产生酸的酸产生化合物（B）和有机溶剂（C）的抗蚀剂组合物：含氟聚合物（A）：具有封闭的酸性基团的含氟聚合物，其为 含有式（1）的氟化二烯与由式（2）的丙烯酸类单体聚合形成的单体单元形成的单体单元的氟聚合物，即通过使式（2）的氟化二烯聚合而得到的共聚物 1）和式（2）的丙烯酸类单体没有封端的酸性基团，通过在共聚物中形成封闭的酸性基团获得：CF 2 = CR 1 -Q-CR 2 = CH 2（1） R 1和R 2彼此独立地是氢原子，氟原子，甲基或三氟甲基，Q是可以形成一个或多个取代基的封闭的酸性基团的二价有机基团 酸性基团，酸性基团或基团 可以转化为封闭的酸性基团，而不是酸性基团; CH 2 = CR 3 -CO 2 R 4（2）其中R 3是氢原子，氟原子，甲基或三氟甲基，R 4是氢原子，烃基， 具有酸性基团的有机基团，具有能够通过酸形成酸性基团的封闭酸性基团的有机基团或具有可以转化为封闭酸性基团并且不是酸性基团的基团的有机基团 。