公开(公告)号：US20040181091A1

公开(公告)日：2004-09-16

申请号：US10808274

申请日：2004-03-25

Applicant: ASAHI GLASS COMPANY LIMITED

Inventor： Masahiro Ito ,  Kunio Watanabe ,  Takashi Okazoe ,  Isamu Kaneko ,  Daisuke Shirakawa

IPC: C07C39/82

CPC classification number: C07C309/82 ,  C07C51/60 ,  C07C303/22 ,  C07C59/135

Abstract: The present invention provides a process whereby fluorine atom-containing sulfonyl fluoride compound(s) useful as e.g. materials for ion-exchange membranes, can be produced efficiently and at low cost without structural limitations while solving the difficulties in production. Namely, the present invention provides a process which comprises reacting XSO2RA-E1 (1) with RB-E2 (2) to form XSO2RA-E-RB (3), then reacting (3) with fluorine in a liquid phase to form FSO2RAF-EF-RBF (4), and further, decomposing the compound to obtain FSO2RAF-EF1 (5), wherein RA is a bivalent organic group, E1 is a monovalent reactive group, RB is a monovalent organic group, E2 is a monovalent reactive group which is reactive with E1, E is a bivalent connecting group formed by the reaction of E1 with E2, RAF is a bivalent organic group formed by the fluorination of RA, etc., RBF is the same group as RB, etc., EF is a bivalent connecting group formed by the fluorination of E, etc., EF1 is a monovalent group formed by the decomposition of EF, and X is a halogen atom.

Abstract translation: 本发明提供了一种可用于例如氟原子的磺酰氟化合物的方法。 用于离子交换膜的材料可以在没有结构限制的情况下有效且低成本地生产，同时解决生产上的困难。 即，本发明提供了一种方法，其包括使XSO 2 R -E 1（1）与R B -E 2（2）反应以形成XSO 2 R aA-E（3） 然后使液相中的（3）与氟反应形成FSO 2 R“-E -R （4），进一步分解该化合物以获得FSO 2 R 1 -E F1（ 5），其中R A是二价有机基团，E 1是单价反应性基团，R B是一价有机基团，E 2是与E 1反应的一价反应性基团 > E是通过E 1与E 2的反应形成的二价连接基团，R AF是​​通过R AA的氟化形成的二价有机基团等，R 是 与R等相同的基团，E 是通过E等氟化形成的二价连接基团，E 是通过分解形成的一价基团，并且 X是卤原子。

公开(公告)号：US20040033439A1

公开(公告)日：2004-02-19

申请号：US10635514

申请日：2003-08-07

Applicant: ASAHI GLASS COMPANY LIMITED

Inventor： Isamu Kaneko ,  Shinji Okada ,  Yasuhide Kawaguchi ,  Yoko Takebe ,  Shun-Ichi Kodama

IPC: B05D003/06 ,  G03C001/492

CPC classification number: G03F7/0392 ,  G03F7/0046 ,  G03F7/0395 ,  Y10S430/114 ,  Y10S430/146 ,  Y10T428/3154

Abstract: To provide a chemical amplification type resist composition which is excellent in transparency to a radiation and in dry etching properties and which gives a resist pattern excellent in sensitivity, resolution, evenness, heat resistance, etc. A resist composition comprising a fluoropolymer (A) which is a fluoropolymer having repeating units formed by cyclopolymerization of a fluorinated diene represented by the formula (1) and which has blocked acidic groups as Q, an acid-generating compound (B) which generates an acid under irradiation with light, and an organic solvent (C):CF2nullCR1nullQnullCR2nullCH2nullnull(1)wherein each of R1 and R2 which are independent of each other, is a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group, and Q is a bivalent organic group having a blocked acidic group capable of forming an acidic group by an acid or a group which can be converted to such a blocked acidic group.

Abstract translation: 提供一种透光性和干蚀刻性能优异的化学放大型抗蚀剂组合物，其具有优异的灵敏度，分辨率，均匀性，耐热性等的抗蚀剂图案。一种抗蚀剂组合物，其包含含氟聚合物（A） 是具有由式（1）表示的氟化二烯和阻聚酸性基团Q的重复单元形成的重复单元，在光照下产生酸的产酸化合物（B）和有机溶剂 （C）：CF 2 = CR 1 -Q-CR 2 = CH 2（1）其中彼此独立的R 1和R 2各自为氢原子，氟原子， 甲基或三氟甲基，Q是具有可以通过酸或能够转化为这种封闭的酸性基团的基团形成酸性基团的封端酸性基团的二价有机基团。

公开(公告)号：US20040013970A1

公开(公告)日：2004-01-22

申请号：US10376243

申请日：2003-03-03

Applicant: Asahi Glass Company, Limited

Inventor： Shinji Okada ,  Yasuhide Kawaguchi ,  Yoko Takebe ,  Isamu Kaneko ,  Shun-ichi Kodama

IPC: G03F007/039

CPC classification number: G03F7/0046 ,  G03F7/0395 ,  Y10S430/115 ,  Y10S430/146

Abstract: A resist composition comprising the following fluoropolymer (A), an acid-generating compound (B) which generates an acid under irradiation with light and an organic solvent (C): Fluoropolymer (A): a fluoropolymer having blocked acidic groups, which is a fluoropolymer having monomeric units formed by cyclopolymerization of a fluorinated diene of the formula (1) and monomeric units formed by polymerization of an acrylic monomer of the formula (2) and which is, when a copolymer obtained by polymerizing the fluorinated diene of the formula (1) and the acrylic monomer of the formula (2), has no blocked acidic groups, obtained by forming blocked acidic groups in the copolymer: CF2nullCR1-Q-CR2nullCH2nullnull(1) wherein each of R1 and R2 which are independent of each other, is a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group, and Q is a bivalent organic group which is a blocked acidic group capable of forming an acidic group by an acid, an acidic group, or a group which can be converted to a blocked acidic group and which is other than an acidic group; CH2nullCR3nullCO2R4nullnull(2) wherein R3 is a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group, and R4 is a hydrogen atom, a hydrocarbon group, an organic group having an acidic group, an organic group having a blocked acidic group capable of forming an acidic group by an acid, or an organic group having a group which can be converted to a blocked acidic group and which is other than an acidic group.

Abstract translation: 包含以下含氟聚合物（A），在光照射下产生酸的酸产生化合物（B）和有机溶剂（C）的抗蚀剂组合物：含氟聚合物（A）：具有封闭的酸性基团的含氟聚合物，其为 含有式（1）的氟化二烯与由式（2）的丙烯酸类单体聚合形成的单体单元形成的单体单元的氟聚合物，即通过使式（2）的氟化二烯聚合而得到的共聚物 1）和式（2）的丙烯酸类单体没有封端的酸性基团，通过在共聚物中形成封闭的酸性基团获得：CF 2 = CR 1 -Q-CR 2 = CH 2（1） R 1和R 2彼此独立地是氢原子，氟原子，甲基或三氟甲基，Q是可以形成一个或多个取代基的封闭的酸性基团的二价有机基团 酸性基团，酸性基团或基团 可以转化为封闭的酸性基团，而不是酸性基团; CH 2 = CR 3 -CO 2 R 4（2）其中R 3是氢原子，氟原子，甲基或三氟甲基，R 4是氢原子，烃基， 具有酸性基团的有机基团，具有能够通过酸形成酸性基团的封闭酸性基团的有机基团或具有可以转化为封闭酸性基团并且不是酸性基团的基团的有机基团 。

公开(公告)号：US20030125490A1

公开(公告)日：2003-07-03

申请号：US10307392

申请日：2002-12-02

Applicant: ASAHI GLASS COMPANY LIMITED

Inventor： Kimiaki Kashiwagi ,  Gen Ogawa ,  Masakuni Sato ,  Kazuya Oharu ,  Isamu Kaneko ,  Norihide Sugiyama ,  Shin Tatematsu

IPC: C08F136/16

CPC classification number: C07C43/17 ,  C08F16/32 ,  C08G77/00 ,  G02B6/02033

Abstract: A novel polymer useful as an optical resin material excellent in heat resistance, a novel monomer for obtaining the polymer, etc., are provided. A fluorinated diene represented by CF2nullCF(CF2)nC(CF3)ROCFnullCF2 (wherein R is a fluorine atom or a trifluoromethyl group, and n is an integer of from 1 to 3), and a polymer thereof.

Abstract translation: 提供了可用作耐热性优异的光学树脂材料的新型聚合物，获得聚合物的新型单体等。 由CF 2 = CF（CF 2）n C（CF 3）ROCF = CF 2（其中R为氟原子或三氟甲基，n为1〜3的整数）表示的氟化二烯及其聚合物。

公开(公告)号：US20040132940A1

公开(公告)日：2004-07-08

申请号：US10637504

申请日：2003-08-11

Applicant: Asahi Glass Company, Limited

Inventor： Isamu Kaneko ,  Yoko Takebe

IPC: C08F114/18 ,  C07C021/18

CPC classification number: C07C43/17 ,  C07C33/423 ,  C07C43/313 ,  C07C69/734 ,  C08F36/20

Abstract: To provide a polymer having a main chain of a fluorinated alicyclic structure, which has a high Tg and which has a functional group concentration sufficient to exhibit the characteristics, and a process for its production. A fluoropolymer having repeating units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the following formula:CF2nullCR1-Q-CR2nullCH2nullnull(1)wherein each of R1 and R2 which are independent of each other, is a hydrogen atom, a fluorine atom, an alkyl group having at most 3 carbon atoms, or a fluoroalkyl group having at most 3 carbon atoms, and Q is a bivalent organic group having a functional group, and a production method which comprises subjecting the above diene to radical polymerization.

Abstract translation: 为了提供具有Tg高且具有足以显示特性的官能团浓度的氟化脂环结构主链的聚合物及其制造方法。 通过由下式表示的含官能团的氟化二烯的环化聚合形成的重复单元的含氟聚合物：CF 2 = CR 1 -Q-CR 2 = CH 2（1）其中R 1和R 2各自独立地选自氢， 2'彼此独立的是氢原子，氟原子，具有至多3个碳原子的烷基或具有至多3个碳原子的氟烷基，Q是具有官能团的二价有机基团 以及包括使上述二烯进行自由基聚合的制造方法。

公开(公告)号：US20030212297A1

公开(公告)日：2003-11-13

申请号：US10442227

申请日：2003-05-21

Applicant: ASAHI GLASS COMPANY LIMITED

Inventor： Masahiro Ito ,  Kunio Watanabe ,  Takashi Okazoe ,  Isamu Kaneko ,  Daisuke Shirakawa

IPC: C07C39/79

CPC classification number: C07C309/82 ,  C07C51/60 ,  C07C303/22 ,  C07C59/135

Abstract: The present invention provides a process whereby fluorine atom-containing sulfonyl fluoride compound(s) useful as e.g. materials for ion-exchange membranes, can be produced efficiently and at low cost without structural limitations while solving the difficulties in production. Namely, the present invention provides a process which comprises reacting XSO2RA-E1 (1) with RB-E2 (2) to form XSO2RA-EnullRB (3), then reacting (3) with fluorine in a liquid phase to form FSO2RAF-EF-RBF (4), and further, decomposing the compound to obtain FSO2RAF-EF1 (5), wherein RA is a bivalent organic group, E1 is a monovalent reactive group, RB is a monovalent organic group, E2 is a monovalent reactive group which is reactive with E1, E is a bivalent connecting group formed by the reaction of E1 with E2, RAF is a bivalent organic group formed by the fluorination of RA, etc., RBF is the same group as RB, etc., EF is a bivalent connecting group formed by the fluorination of E, etc., EF1 is a monovalent group formed by the decomposition of EF, and X is a halogen atom.

Abstract translation: 本发明提供了一种可用于例如氟原子的磺酰氟化合物的方法。 用于离子交换膜的材料可以在没有结构限制的情况下有效且低成本地生产，同时解决生产上的困难。 即，本发明提供了一种方法，其包括使XSO 2 R -E 1（1）与R B -E 2（2）反应以形成XSO 2 R aA-E（3） 然后使液相中的（3）与氟反应形成FSO 2 R“-E -R （4），进一步分解该化合物以获得FSO 2 R 1 -E F1（ 5），其中R A是二价有机基团，E 1是单价反应性基团，R B是一价有机基团，E 2是与E 1反应的一价反应性基团 > E是通过E 1与E 2的反应形成的二价连接基团，R AF是​​通过R AA的氟化形成的二价有机基团等，R 是 与R等相同的基团，E 是通过E等氟化形成的二价连接基团，E 是通过分解形成的一价基团，并且 X是卤原子。

公开(公告)号：US20030148213A1

公开(公告)日：2003-08-07

申请号：US10322665

申请日：2002-12-19

Applicant: ASAHI GLASS COMPANY LIMITED

Inventor： Isamu Kaneko ,  Yoko Takebe ,  Shun-Ichi Kodama

IPC: G03F007/039 ,  G03F007/038

CPC classification number: G03F7/0046 ,  G03F7/0392 ,  G03F7/0395 ,  Y10S430/106 ,  Y10S430/108

Abstract: The following resist composition which is excellent particularly in transparency to light beams and dry etching properties and gives a resist pattern excellent in sensitivity, resolution, evenness, heat resistance, etc., as a chemical amplification type resist, is presented. A resist composition which comprises a fluoropolymer (A) having repeating units represented by a structure formed by the cyclopolymerization of one molecule of a fluorinated diene and one molecule of a monoene, in which the monoene unit in each repeating unit has a blocked acid group capable of regenerating the acid group by the action of an acid, an acid-generating compound (B) which generates an acid upon irradiation with light, and an organic solvent (C).

Abstract translation: 提出了以下抗蚀剂组合物，其特别是对光束的透明性和干蚀刻性能优异，并且提供了作为化学放大型抗蚀剂的灵敏度，分辨率，均匀性，耐热性等优异的抗蚀剂图案。 一种抗蚀剂组合物，其含有具有由一分子氟化二烯和一分子单烯环化聚合形成的结构的重复单元的含氟聚合物（A），其中每个重复单元中的单烯单元具有封闭的酸基团 通过酸的作用再生酸基，在照射时产生酸的产酸化合物（B）和有机溶剂（C）。

公开(公告)号：US20030130409A1

公开(公告)日：2003-07-10

申请号：US10316877

申请日：2002-12-12

Applicant: ASAHI GLASS COMPANY LIMITED

Inventor： Isamu Kaneko ,  Shinji Okada ,  Yasuhide Kawaguchi ,  Yoko Takebe ,  Shun-Ichi Kodama

IPC: C08K003/00

CPC classification number: G03F7/0395 ,  C08L27/12 ,  C08L29/14 ,  G03F7/0046 ,  G03F7/0392 ,  Y10S430/106 ,  Y10S430/108 ,  C08L2666/04

Abstract: The following resist composition of chemical amplification type, which is excellent in transparency to light beams and dry etching properties and gives a resist pattern excellent in sensitivity, resolution, evenness, heat resistance, etc. A resist composition which comprises a fluoropolymer (A) comprising monomer units (a) of a fluorovinyl monomer having nullCF2nullOR (wherein R is a C1-10 alkyl group) and monomer units (b) of an alicyclic ethylenic monomer, an acid-generating compound (B) which generates an acid upon irradiation with light, and an organic solvent (C).

Abstract translation: 化学放大型的抗蚀剂组合物，其光透射性和干蚀刻性能优异，并且提供了灵敏度，分辨率，均匀度，耐热性等优异的抗蚀剂图案。一种抗蚀剂组合物，其包含含氟聚合物（A），其包含 具有-CF2-OR（其中R是C1-10烷基）的氟乙烯基单体的单体单元（a）和脂环族烯属单体的单体单元（b），产生酸的产酸化合物（B） 用光照射，和有机溶剂（C）。