公开(公告)号：US20170002461A1

公开(公告)日：2017-01-05

申请号：US15201019

申请日：2016-07-01

Applicant: APPLIED MATERIALS, INC.

Inventor： William JOHANSON ,  Kirankumar SAVANDAIAH ,  Adolph Miller ALLEN ,  Xin WANG ,  Prashant PRABHU

IPC: C23C16/455

CPC classification number: C23C14/3407 ,  C23C14/564 ,  H01J37/32477 ,  H01J37/34 ,  H01J37/3488

Abstract: Embodiments of process kits and process chambers incorporating same are provided herein. In some embodiments, a process kit includes a deposition ring configured to be disposed on a substrate support designed to support a substrate having a given width, including: an annular band configured to rest on a lower ledge of the substrate support; an inner lip extending upwardly from an inner edge of the annular band, wherein an inner surface of the inner lip and an inner surface of the annular band together form a central opening having a width that is less than the given width, and wherein a depth between an upper surface of the annular band and an upper surface of the inner lip is between about 24 mm and about 38 mm; a channel disposed radially outward of the annular band; and an outer lip extending upwardly and disposed radially outward of the channel.

Abstract translation: 本文提供了具有加工套件和加工腔室的实施例。 在一些实施例中，处理套件包括沉积环，其被配置为设置在设计成支撑具有给定宽度的衬底的衬底支撑件上，包括：环形带，被配置为搁置在衬底支撑件的下凸缘上; 从所述环形带的内边缘向上延伸的内唇缘，其中所述内唇缘的内表面和所述环形带的内表面一起形成具有小于给定宽度的宽度的中心开口，并且其中， 在环形带的上表面和内唇缘的上表面之间的距离在约24mm和约38mm之间; 设置在所述环形带的径向外侧的通道; 以及向外延伸并设置在通道的径向外侧的外唇缘。

公开(公告)号：US20170098530A1

公开(公告)日：2017-04-06

申请号：US15287675

申请日：2016-10-06

Applicant: APPLIED MATERIALS, INC.

Inventor： William JOHANSON ,  Kirankumar SAVANDAIAH ,  Xin WANG ,  Prashant PRABHU

IPC: H01J37/34 ,  H01J37/32 ,  C23C14/35

CPC classification number: H01J37/3441 ,  C23C14/3407 ,  C23C14/564 ,  H01J37/32477 ,  H01J37/32522 ,  H01J37/32642 ,  H01J37/32651

Abstract: Embodiments of process kits and process chambers incorporating same are provided herein. In some embodiments, a process kit includes: a one-piece process kit shield having a cylindrical body having an upper portion and a lower portion; an adapter section extending radially outward and having a resting surface to support the one-piece process kit shield on walls of a chamber and a sealing surface on which a chamber lid rests to seal off an inner volume of the chamber when the one-piece process kit shield is placed in the chamber; a heat transfer channel extending through the adapter section; and a protruding section extending radially inward from the lower portion; a resting bracket having an upper portion coupled to the adapter section and a lower portion extending radially inward; a cover ring disposed beneath the protruding section; and a deposition ring disposed beneath the cover ring.