公开(公告)号：US20210020484A1

公开(公告)日：2021-01-21

申请号：US16914103

申请日：2020-06-26

Applicant: APPLIED MATERIALS, INC.

Inventor： Keith Miller ,  Farzad HOUSHMAND ,  Prasoon SHUKLA

IPC: H01L21/677 ,  H01L21/673

Abstract: Methods and apparatus for a PVD chamber are provided herein. In some embodiments, a selective PVD chamber includes a first housing surrounding a movable substrate support; a second housing adjacent the first housing; an opening disposed between the first housing and the second housing that partially exposes a top surface of the movable substrate support, wherein the opening includes a first curved side; and an elongate target disposed in the second housing to provide a stream of material flux from the elongate target into the first housing via the opening.