公开(公告)号：US20190351433A1

公开(公告)日：2019-11-21

申请号：US16415665

申请日：2019-05-17

Applicant: APPLIED MATERIALS, INC.

Inventor： MUHANNAD MUSTAFA ,  MUHAMMAD RASHEED

IPC: B05B1/18 ,  B05B7/08 ,  H01L21/67

Abstract: Embodiments of multi-zone showerheads are provided herein. In some embodiments, a multi-zone showerhead includes: a body having an outer surface and including a plurality of fluidly independent plenums; and a plurality of gas distribution plugs extending through the body, wherein at least one gas distribution plug includes a first internal gas passageway coupling a first plenum of the plurality of fluidly independent plenums to the outer surface and a second internal gas passageway coupling a second plenum of the plurality of fluidly independent plenums to the outer surface. In some embodiments, the body can include: a top plate; a bottom plate; and one or more intermediate plates disposed between the top plate and the bottom plate, wherein individual plenums of the plurality of fluidly independent plenums are respectively defined between adjacent plates of the top plate, the bottom plate, and the one or more intermediate plates.

公开(公告)号：US20190078725A1

公开(公告)日：2019-03-14

申请号：US15719985

申请日：2017-09-29

Applicant: APPLIED MATERIALS, INC.

Inventor： MUHANNAD MUSTAFA ,  MUHAMMAD M. RASHEED

IPC: F16M11/12 ,  C23C16/458 ,  H01J37/32

Abstract: Embodiments of the present disclosure are directed to a gimbal assembly, that includes a gimbal plate having a central opening, a pivot screw disposed within a pivot mount formed in the gimbal plate, wherein the pivot screw includes a spherical pivot head about which the gimbal plate pivots, one or more motors coupled to the gimbal plate configured to provide in-situ gimbal plate motion about the spherical pivot head, and a plurality of leveling indicators configured that determine deflection of gimbal plate.

公开(公告)号：US20190390337A1

公开(公告)日：2019-12-26

申请号：US16017702

申请日：2018-06-25

Applicant: APPLIED MATERIALS, INC.

Inventor： MUHANNAD MUSTAFA ,  MUHAMMAD M. RASHEED

IPC: C23C16/458 ,  H01L21/683 ,  H01L21/687 ,  C23C16/455

Abstract: Embodiments of substrate processing equipment and rotatable substrate supports incorporating the same are provided herein. In some embodiments, the substrate support may include a pedestal having a substrate receiving surface, a shaft having an upper end, a lower end, and a central opening, where the shaft is coupled to the pedestal at the upper end, a hub circumscribing the shaft, where the shaft is rotatable with respect to the hub, and where the hub includes a first port that extends from an outer surface of the hub to a volume between the hub and the shaft, and a ferrofluid sealing assembly disposed between the hub and the shaft.

公开(公告)号：US20210187521A1

公开(公告)日：2021-06-24

申请号：US16721724

申请日：2019-12-19

Applicant: APPLIED MATERIALS, INC.

Inventor： MUHANNAD MUSTAFA ,  MUHAMMAD M. RASHEED

IPC: B05B1/18 ,  C23C16/455 ,  B05B1/00

Abstract: Embodiments of showerheads for use in a process chamber are provided herein. In some embodiments, a showerhead includes a first spiral channel extending from a central region to a peripheral region of the showerhead; a second spiral channel extending from a central region to a peripheral region of the showerhead, wherein the second spiral channel is interleaved with the first spiral channel and fluidly independent from the first spiral channel; a plurality of first channels extending from the first spiral channel to a plurality of first gas distribution holes on a lower surface of the showerhead, wherein each first channel is a singular channel extending at an angle; and a plurality of second channels extending from the second spiral channel to a plurality of second gas distribution holes on the lower surface of the showerhead, wherein each second channel is a singular channel extending at an angle.

公开(公告)号：US20190229007A1

公开(公告)日：2019-07-25

申请号：US16249716

申请日：2019-01-16

Applicant: APPLIED MATERIALS, INC.

Inventor： MUHANNAD MUSTAFA ,  MUHAMMAD M. RASHEED ,  YU LEI ,  AVGERINOS V. GELATOS ,  VIKASH BANTHIA ,  VICTOR H. CALDERON ,  SHI WEI TOH ,  YUNG-HSIN LEE ,  ANINDITA SEN

IPC: H01L21/687 ,  H01J37/32

Abstract: Methods and apparatus for processing substrates are provided herein. In some embodiments, a process kit for a substrate support includes: an upper edge ring made of quartz and having an upper surface and a lower surface, wherein the upper surface is substantially planar and the lower surface includes a stepped lower surface to define a radially outermost portion and a radially innermost portion of the upper edge ring.