公开(公告)号：US20140251788A1

公开(公告)日：2014-09-11

申请号：US13785880

申请日：2013-03-05

Applicant: APPLIED MATERIALS, INC.

Inventor： Zhenbin GE ,  Alan A. RITCHIE

IPC: C23C14/34

CPC classification number: C23C14/54 ,  C23C14/3471 ,  C23C14/35 ,  H01J37/32165 ,  H01J37/32403 ,  H01J37/3405 ,  H01J37/3441 ,  H01J37/3464 ,  H01J37/3476

Abstract: Methods and apparatus for processing substrates are provided herein. In some embodiments, a physical vapor deposition chamber includes a first RF power supply having a first base frequency and coupled to one of a target or a substrate support; and a second RF power supply having a second base frequency and coupled to one of the target or the substrate support, wherein the first and second base frequencies are integral multiples of each other, wherein the second base frequency is modified to an offset second base frequency that is not an integral multiple of the first base frequency.

Abstract translation: 本文提供了处理衬底的方法和装置。 在一些实施例中，物理气相沉积室包括具有第一基本频率并且耦合到目标或基板支架之一的第一RF电源; 以及具有第二基本频率并耦合到所述目标或所述衬底支架之一的第二RF电源，其中所述第一和第二基本频率是彼此的整数倍，其中所述第二基本频率被修改为偏移的第二基本频率 这不是第一个基本频率的整数倍。

公开(公告)号：US20140053776A1

公开(公告)日：2014-02-27

申请号：US14029462

申请日：2013-09-17

Applicant: Applied Materials, Inc.

Inventor： Wei Ti LEE ,  Ted GUO ,  Steve H. CHIAO ,  Alan A. RITCHIE

IPC: C23C16/455

CPC classification number: C23C16/45561 ,  C23C14/165 ,  C23C16/4402 ,  C23C16/4404 ,  C23C16/45565 ,  C23C16/45591 ,  Y10T29/497 ,  Y10T29/49826 ,  Y10T137/0491 ,  Y10T137/9029

Abstract: A system of gas lines for a processing chamber and a method of forming a gas line system for a processing chamber are provided. The system of gas lines includes electropolished multi-way valves that connect electropolished linear gas lines. By using multi-way valves rather than tee-fittings and electropolishing the linear gas lines, the nucleation of contaminating particles in the system of gas lines may be reduced.

Abstract translation: 提供了一种用于处理室的气体管线系统和形成用于处理室的气体管线系统的方法。 气体管线系统包括连接电抛光线性气体管线的电抛光多通阀。 通过使用多通阀而不是三通阀，并对线性气体管线进行电解抛光，可以减少气体管线系统中污染颗粒的成核。