公开(公告)号：US20140053776A1

公开(公告)日：2014-02-27

申请号：US14029462

申请日：2013-09-17

Applicant: Applied Materials, Inc.

Inventor： Wei Ti LEE ,  Ted GUO ,  Steve H. CHIAO ,  Alan A. RITCHIE

IPC: C23C16/455

CPC classification number: C23C16/45561 ,  C23C14/165 ,  C23C16/4402 ,  C23C16/4404 ,  C23C16/45565 ,  C23C16/45591 ,  Y10T29/497 ,  Y10T29/49826 ,  Y10T137/0491 ,  Y10T137/9029

Abstract: A system of gas lines for a processing chamber and a method of forming a gas line system for a processing chamber are provided. The system of gas lines includes electropolished multi-way valves that connect electropolished linear gas lines. By using multi-way valves rather than tee-fittings and electropolishing the linear gas lines, the nucleation of contaminating particles in the system of gas lines may be reduced.

Abstract translation: 提供了一种用于处理室的气体管线系统和形成用于处理室的气体管线系统的方法。 气体管线系统包括连接电抛光线性气体管线的电抛光多通阀。 通过使用多通阀而不是三通阀，并对线性气体管线进行电解抛光，可以减少气体管线系统中污染颗粒的成核。