公开(公告)号：US20250146119A1

公开(公告)日：2025-05-08

申请号：US18939220

申请日：2024-11-06

Applicant: Applied Materials, Inc.

Inventor： Martin Lee RIKER ,  Abilash SAINATH ,  Suhas UMESH ,  Keyvan KASHEFIZADEH ,  Yunho KIM ,  Sundarapandian Ramaling Vijayalaskshmi REDDY ,  Prashanth KOTHNUR

IPC: C23C14/02 ,  C23C14/35

Abstract: In some embodiments, a physical vapor deposition apparatus includes a top flux optimizer configured to be biased. The physical vapor deposition apparatus further includes an intermediate flux optimizer configured to be biased. The top flux optimizer and the intermediate flux optimizer are separated by a first distance. The physical vapor deposition apparatus further includes a bottom flux optimizer configured to be biased. The bottom flux optimizer and the intermediate flux optimizer are separated by a second distance. The physical vapor deposition apparatus further includes a top power source coupled to the top flux optimizer, an intermediate power source coupled to the intermediate flux optimizer, and a bottom power source coupled to the bottom flux optimizer.

公开(公告)号：US20210343508A1

公开(公告)日：2021-11-04

申请号：US16863541

申请日：2020-04-30

Applicant: APPLIED MATERIALS, INC.

Inventor： Andrew NGUYEN ,  Xue Yang CHANG ,  Yu LEI ,  Xianmin TANG ,  John C. FORSTER ,  Yogananda Sarode VISHWANATH ,  Abilash SAINATH ,  Tza-Jing GUNG

IPC: H01J37/32 ,  C23C16/44

Abstract: Embodiments of process kits for use in a process chamber are provided herein. In some embodiments, a process kit for use in a process chamber includes: a chamber liner having a tubular body with an upper portion and a lower portion; a confinement plate coupled to the lower portion of the chamber liner and extending radially inward from the chamber liner, wherein the confinement plate includes a plurality of slots; a shield ring disposed within the chamber liner and movable between the upper portion of the chamber liner and the lower portion of the chamber liner; and a plurality of ground straps coupled to the shield ring at a first end of each ground strap of the plurality of ground straps and to the confinement plate at a second end of each ground strap to maintain electrical connection between the shield ring and the chamber liner when the shield ring moves.