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公开(公告)号：US11856180B1
公开(公告)日：2023-12-26
申请号：US17810098
申请日：2022-06-30
Applicant: Apple Inc.
Inventor： Boris Morgenstein , Assaf Avraham , David Pawlowski , Gidi Lasovski , Refael Della Pergola , Tom Levy , Yohai Zmora
IPC: H04N13/254 , G06T7/521 , G01B11/00 , G06T5/00 , G01B11/25
CPC classification number: H04N13/254 , G01B11/2504 , G06T5/006 , G06T7/521
Abstract: One disclosed embodiment includes techniques for temperature-dependent reference image correction in structured light projectors that may be used for generating three-dimensional (3D) scene depth maps. The techniques disclosed herein include receiving an indication of a temperature (e.g., an actual current operating temperature or a change in the current operating temperature relative to an established reference temperature) associated with one or more components of a projector and then determining, based on the temperature indication, an amount of adjustment needed to correct a reference pattern image based on an estimated effective focal length change of the projector. Next, a reference pattern image may be appropriately adjusted, e.g., based on the determined amount of effective focal length adjustment caused by the current operating temperature of the projector, to generate a corrected reference image, which may then be used to generate a more accurate 3D scene depth maps at the projector's current operating temperature.
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公开(公告)号：US10551178B2
公开(公告)日：2020-02-04
申请号：US16370997
申请日：2019-03-31
Applicant: Apple Inc.
Inventor： Zafrir Mor , Boris Morgenstein
IPC: G02B27/10 , G01B11/25 , G02B5/18 , H01S5/00 , H01S5/42 , G02B27/20 , G02B27/42 , G06K9/20 , G06F3/03 , G06F3/042 , G06K9/00 , H01S5/022 , F21Y115/10
Abstract: An optoelectronic device includes a semiconductor substrate, an array of optical emitters arranged on the substrate in a two-dimensional pattern, a projection lens and a diffractive optical element (DOE). The projection lens is mounted on the semiconductor substrate and is configured to collect and focus light emitted by the optical emitters so as to project optical beams containing a light pattern corresponding to the two-dimensional pattern of the optical emitters on the substrate. The DOE is mounted on the substrate and is configured to produce and project multiple overlapping replicas of the pattern.
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公开(公告)号：US20240087149A1
公开(公告)日：2024-03-14
申请号：US17944207
申请日：2022-09-14
Applicant: Apple Inc.
Inventor： Shay Yosub , Noam Badt , Boris Morgenstein , Yuval Vardi , David Pawlowski , Assaf Avraham , Pieter Spinnewyn , Tom Levy , Yohai Zmora
IPC: G06T7/521 , G06T5/50 , G06V10/141 , G06V10/24 , G06V10/74
CPC classification number: G06T7/521 , G06T5/50 , G06V10/141 , G06V10/245 , G06V10/761 , G06T2207/10028 , G06T2207/20221
Abstract: A method for depth mapping includes providing a depth mapping device comprising a projector, which is configured to project a pattern of optical radiation onto a target area over a first field of view about a projection axis, and a camera, which is configured to capture images of the target area within a second field of view, narrower than the first field of view, about a camera axis, which is offset transversely relative to the projection axis. The projector projects the pattern onto first and second planes at first and second distances from the camera, and the camera captures first and second reference images containing first and second parts of the pattern on the first and second planes, respectively. The first and second reference images are combined to produce an extended reference image including both the first and second parts of the pattern.
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4.发明公开公开(公告)号：US20240007606A1
公开(公告)日：2024-01-04
申请号：US17810098
申请日：2022-06-30
Applicant: Apple Inc.
Inventor： Boris Morgenstein , Assaf Avraham , David Pawlowski , Gidi Lasovski , Refael Della Pergola , Tom Levy , Yohai Zmora
IPC: H04N13/254 , G06T5/00 , G06T7/521 , G01B11/25
CPC classification number: H04N13/254 , G06T5/006 , G06T7/521 , G01B11/2504
Abstract: One disclosed embodiment includes techniques for temperature-dependent reference image correction in structured light projectors that may be used for generating three-dimensional (3D) scene depth maps. The techniques disclosed herein include receiving an indication of a temperature (e.g., an actual current operating temperature or a change in the current operating temperature relative to an established reference temperature) associated with one or more components of a projector and then determining, based on the temperature indication, an amount of adjustment needed to correct a reference pattern image based on an estimated effective focal length change of the projector. Next, a reference pattern image may be appropriately adjusted, e.g., based on the determined amount of effective focal length adjustment caused by the current operating temperature of the projector, to generate a corrected reference image, which may then be used to generate a more accurate 3D scene depth maps at the projector's current operating temperature.
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公开(公告)号：US20160178915A1
公开(公告)日：2016-06-23
申请号：US15057140
申请日：2016-03-01
Applicant: APPLE INC.
Inventor： Zafrir Mor , Boris Morgenstein
CPC classification number: G01B11/2513 , F21Y2115/10 , G02B27/1093 , G02B27/20 , G02B27/4205 , G06F3/0304 , G06F3/042 , G06K9/00201 , G06K9/2036 , G06K2209/401 , H01S5/005 , H01S5/02288 , H01S5/423
Abstract: An optoelectronic device includes a semiconductor substrate, an array of optical emitters arranged on the substrate in a two-dimensional pattern, a projection lens and a diffractive optical element (DOE). The projection lens is mounted on the semiconductor substrate and is configured to collect and focus light emitted by the optical emitters so as to project optical beams containing a light pattern corresponding to the two-dimensional pattern of the optical emitters on the substrate. The DOE is mounted on the substrate and is configured to produce and project multiple overlapping replicas of the pattern.
Abstract translation: 光电器件包括半导体衬底，以二维图案布置在衬底上的光发射体阵列，投影透镜和衍射光学元件（DOE）。 投影透镜安装在半导体基板上，并且被配置为收集和聚焦由光发射器发射的光，以将包含对应于光发射器的二维图案的光图案的光束投射到基板上。 DOE安装在基板上，并被配置为产生并投影图案的多个重叠的副本。
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Patent Agency Ranking
公开(公告)号：US10288417B2
公开(公告)日：2019-05-14
申请号：US16005720
申请日：2018-06-12
Applicant: APPLE INC.
Inventor： Zafrir Mor , Boris Morgenstein
IPC: G02B27/10 , G01B11/25 , G02B5/18 , H01S5/00 , H01S5/42 , G02B27/20 , G02B27/42 , G06K9/20 , G06F3/03 , G06F3/042 , G06K9/00 , H01S5/022 , F21Y115/10
Abstract: An optoelectronic device includes a semiconductor substrate, an array of optical emitters arranged on the substrate in a two-dimensional pattern, a projection lens and a diffractive optical element (DOE). The projection lens is mounted on the semiconductor substrate and is configured to collect and focus light emitted by the optical emitters so as to project optical beams containing a light pattern corresponding to the two-dimensional pattern of the optical emitters on the substrate. The DOE is mounted on the substrate and is configured to produce and project multiple overlapping replicas of the pattern.
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公开(公告)号：US20180292200A1
公开(公告)日：2018-10-11
申请号：US16005720
申请日：2018-06-12
Applicant: APPLE INC.
Inventor： Zafrir Mor , Boris Morgenstein
CPC classification number: G01B11/2513 , F21Y2115/10 , G02B27/1093 , G02B27/20 , G02B27/4205 , G06F3/0304 , G06F3/042 , G06K9/00201 , G06K9/2036 , G06K2209/401 , H01S5/005 , H01S5/02288 , H01S5/423
Abstract: An optoelectronic device includes a semiconductor substrate, an array of optical emitters arranged on the substrate in a two-dimensional pattern, a projection lens and a diffractive optical element (DOE). The projection lens is mounted on the semiconductor substrate and is configured to collect and focus light emitted by the optical emitters so as to project optical beams containing a light pattern corresponding to the two-dimensional pattern of the optical emitters on the substrate. The DOE is mounted on the substrate and is configured to produce and project multiple overlapping replicas of the pattern.
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公开(公告)号：US20160025993A1
公开(公告)日：2016-01-28
申请号：US14341860
申请日：2014-07-28
Applicant: APPLE INC.
Inventor： Zafrir Mor , Boris Morgenstein
CPC classification number: G02B27/4205 , F21V5/048 , F21Y2105/00 , F21Y2115/10 , F21Y2115/30 , G01B11/2513 , G02B27/1093 , G02B27/20 , G06K9/2036 , G06K2209/401 , G06T7/521 , H01S5/005 , H01S5/423
Abstract: An optoelectronic device includes a semiconductor substrate, an array of optical emitters arranged on the substrate in a two-dimensional pattern, a projection lens and a diffractive optical element (DOE). The projection lens is mounted on the semiconductor substrate and is configured to collect and focus light emitted by the optical emitters so as to project optical beams containing a light pattern corresponding to the two-dimensional pattern of the optical emitters on the substrate. The DOE is mounted on the substrate and is configured to produce and project multiple overlapping replicas of the pattern.
Abstract translation: 光电器件包括半导体衬底，以二维图案布置在衬底上的光发射体阵列，投影透镜和衍射光学元件（DOE）。 投影透镜安装在半导体基板上，并且被配置为收集和聚焦由光发射器发射的光，以将包含对应于光发射器的二维图案的光图案的光束投射到基板上。 DOE安装在基板上，并被配置为产生并投影图案的多个重叠的副本。
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公开(公告)号：US10054430B2
公开(公告)日：2018-08-21
申请号：US15057140
申请日：2016-03-01
Applicant: APPLE INC.
Inventor： Zafrir Mor , Boris Morgenstein
IPC: G02B27/10 , G01B11/25 , G02B5/18 , H01S5/00 , H01S5/42 , G02B27/20 , G02B27/42 , G06K9/20 , G06F3/03 , G06F3/042 , H01S5/022 , F21Y115/10
CPC classification number: G01B11/2513 , F21Y2115/10 , G02B27/1093 , G02B27/20 , G02B27/4205 , G06F3/0304 , G06F3/042 , G06K9/00201 , G06K9/2036 , G06K2209/401 , H01S5/005 , H01S5/02288 , H01S5/423
Abstract: An optoelectronic device includes a semiconductor substrate, an array of optical emitters arranged on the substrate in a two-dimensional pattern, a projection lens and a diffractive optical element (DOE). The projection lens is mounted on the semiconductor substrate and is configured to collect and focus light emitted by the optical emitters so as to project optical beams containing a light pattern corresponding to the two-dimensional pattern of the optical emitters on the substrate. The DOE is mounted on the substrate and is configured to produce and project multiple overlapping replicas of the pattern.
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公开(公告)号：US20250113017A1
公开(公告)日：2025-04-03
申请号：US18479848
申请日：2023-10-03
Applicant: APPLE INC.
Inventor： Nir Goldfriend , Yuval Vardi , David Pawlowski , Roey Zuitlin , Gidi Lasovski , Boris Morgenstein
IPC: H04N13/271 , H04N13/254 , H04N13/296
Abstract: A method for depth mapping includes operating a projector at a first temperature to project a pattern of optical radiation onto a reference plane, capturing a first image of the projected pattern on the reference plane, using the first image and an optical and thermal model of the projector to compute multiple reference images associated with different respective temperatures of the projector. Using the projector, the pattern is projected onto a scene, and a temperature of the projector is measured while projecting the pattern. The method further includes capturing a second image of the projected pattern on the scene, selecting one of the reference images responsively to the measured temperature; and computing a depth map of the scene by comparing the pattern in the second image to the selected one of the reference images.
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