公开(公告)号：US20030107009A1

公开(公告)日：2003-06-12

申请号：US10338620

申请日：2003-01-08

Applicant: ADVANTEST CORPORATION

Inventor： Hitoshi Tanaka

IPC: H01J037/302

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F1/20 ,  H01J37/3177 ,  H01J2237/0435

Abstract: An electron beam exposure apparatus characterized by comprising an electron gun producing an electron beam, a first shaping member for shaping the cross-sectional shape of the electron beam, a second shaping member serving as a splitting member having a splitting part including splitting openings for splitting the electron beam into electron beams of different shapes, and a blocking member for blocking at least one of the electron beams.

Abstract translation: 一种电子束曝光装置，其特征在于包括产生电子束的电子枪，用于使电子束的横截面形状成形的第一成形构件，用作分离构件的第二成形构件，具有分离部分，该分离部分包括用于分裂的分离开口 电子束变成不同形状的电子束，以及用于阻挡至少一个电子束的阻挡构件。