公开(公告)号：US20240076656A1

公开(公告)日：2024-03-07

申请号：US18215296

申请日：2023-06-28

Applicant: 10x Genomics, Inc.

Inventor： David Michael PATTERSON ,  Steven William SHORT ,  Dieter WILK ,  Pingwei ZHUANG ,  Solongo Batjargal ZIRALDO

IPC: C12N15/10 ,  B01J19/00 ,  B41M5/24 ,  C12N9/12 ,  C12N9/22 ,  G03F7/11

CPC classification number: C12N15/1093 ,  B01J19/0046 ,  B41M5/24 ,  C12N9/1264 ,  C12N9/22 ,  C12Y207/07031 ,  C12Y301/11001 ,  G03F7/11 ,  B01J2219/00855 ,  B01J2219/00927 ,  B01J2219/00993 ,  B01J2219/0894 ,  B01J2540/68

Abstract: Provided in some aspects are methods for light-controlled in situ surface patterning of a substrate comprising a step of blocking or ablating oligonucleotide molecules in a boundary region separating a plurality of spot regions, and attaching oligonucleotides to oligonucleotide molecules in a first one or more of the spot regions.