摘要:
A silver halide photographic light-sensitive material is disclosed, comprising a monodisperse silver halide emulsion of 0.30 .mu.m or less in average silver halide grain size containing at least 75 mol % silver chloride and 2 mol % or less silver iodide, and having incorporated in said emulsion a dye represented by the formula (I) ##STR1## wherein Z represents atoms forming a thiazoline nucleus, a thiazole nucleus, or a benzothiazole nucleus,X represents an oxygen atom or a sulfur atom, andR.sub.1 and R.sub.2 each represents an unsubstituted or substituted aliphatic group or an unsubstituted or substituted aromatic group.
摘要:
A silver halide photographic light-sensitive material is described, comprising a support, at least one light-sensitive silver halide emulsion layer on the support, and at least one light-insensitive top layer provided on the emulsion layer, wherein at least one of the emulsion layer and other constituent layers contains a compound represented by the general formula (I)R.sup.1 --NHNH--G--R.sup.2 (I)wherein R.sup.1 is a substituted or unsubstituted aryl group, R.sup.2 is a hydrogen atom, a substituted or unsubstituted aryl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, or a substituted or unsubstituted aryloxy group, and G is a carbonyl group, a sulfonyl group, a sulfoxy group, a phosphoryl group, or an N-substituted or unsubstituted imino group and wherein said at least one light-insensitive top layer is hardened so as to have a melting time at least 50 seconds longer than that of the emulsion layer. This material enables the formation of a negative image having super contrast with a stable processing solution.
摘要:
A silver halide photographic material for a photomechanical process is disclosed. The material comprises a support having provided thereon at least one light-sensitive silver halide emulsion layer and at least one light-insensitive upper layer disposed on the upper side of the emulsion layer. The light-sensitive upper layer has a greater melting time than the light-sensitive emulsion layer. The emulsion layer contains starch, modified starch and/or macromolecular polysaccharides produced from starch using a microbial fermentation process. The material has greatly improved reduction processability.
摘要:
A lithographic silver halide photographic light-sensitive material is described which scarcely exhibits colored fringe and black pepper, forms halftone dots of good quality whether a fresh or an exhausted developer is used for processing thereof, and which scarcely shows a drop in sensitivity even when a developer contaminated by a fixing solution is used; said material comprises a support and at least one lithographic silver halide emulsion layer, and containing in said emulsion layer or in another hydrophilic colliodal layer which does not contain silver halide emulsion at least one compound represented by formula (I) ##STR1## wherein M represents hydrogen, an alkali metal ion or --NH.sub.4.sup..sym. ; X represents --SO.sub.2 NHR', --COOM', --SO.sub.3 M', --OH or --CONH.sub.2, wherein M' represents hydrogen, an alkali metal ion or --NH.sub.4.sup..sym. ; and R' represents hydrogen or an alkyl group having from 1 to 3 carbon atoms; R represents hydrogen or an alkyl group having from 1 to 3 carbon atoms; and n represents 1 or 2.
摘要:
A silver halide photographic material for a photomechanical process which has an excellent reduction processing aptitude is disclosed. The material is comprised of a support having a light-sensitive silver halide emulsion layer thereon and a light-insensitive layer disposed outside the silver halide emulsion layer. The light-insensitive layer contains a hydrophilic colloidal binder coated in such an amount per unit area as to be 1.0 or more times that of a hydrophilic colloidal binder contained in the silver halide emulsion layer.
摘要:
A silver halide photographic light-sensitive material for photomechanical process is described, comprising a support, at least one photosensitive silver halide emulsion layer thereon, and at least one light-insensitive upper layer on the emulsion layer. At least one of the light-insensitive upper layers contains a compound having an electric charge and being substantially insoluble in water but soluble in a water-miscible organic solvent; a method for a reducing treatment is also described, which comprises bringing a silver image formed on the light-sensitive material into contact with a reducer through the light-insensitive upper layer containing the aforesaid compound.
摘要:
A silver halide photographic light-sensitive material for photomechanical process and a method for the reduction treatment of said light-sensitive material are described. The light-sensitive material comprises a support, at least one light-sensitive silver halide emulsion layer, and at least one light-insensitive upper layer, characterized in that at least one light-insensitive upper layer contains a polymer comprising: (a) a monomer unit containing at least one group having an electric charge; and (b) a monomer unit having a functional group capable of crosslinking through a gelatin hardening agent with a like functional group of another polymer chain of the same type or with gelatin. The light-sensitive material is very advantageous; for example, it has greatly improved reduction treatment suitability, and the reduction treatment suitability is not deteriorated even if the amount of silver coated per unit area is reduced.
摘要:
Silver halide photographic materials providing wash-off relief images and having excellent shelf life comprising a support having formed thereon at least a silver halide photosensitive emulsion layer and said silver halide emulsion layer or another hydrophilic colloid layer containing a polyhydroxy-spiro-bis-chroman tanning developing agent and a gallic acid alkyl ester is disclosed with a process forming relief images.