Sensor for quantitative measurement of electromechanical properties and microstructure of nano-materials and method for making the same
    1.
    发明授权
    Sensor for quantitative measurement of electromechanical properties and microstructure of nano-materials and method for making the same 有权
    用于定量测量纳米材料机电性能和显微组织的传感器及其制备方法

    公开(公告)号:US08302494B2

    公开(公告)日:2012-11-06

    申请号:US12756131

    申请日:2010-04-07

    Abstract: A sensor for quantitative testing electromechanical properties and microstructure of nano-materials and a manufacturing method for the sensor are provided. The sensor comprises a suspended structure, pressure-sensitive resistor cantilevers, support beams, bimetallic strip and other components. When the bimetallic strip produces bending deformation, one of the pressure-sensitive resistor cantilevers is actuated and then stretches the low-dimensional nano-materials which drive the other pressure-sensitive resistor cantilever to bend. Through signal changes are outputted by the Wheatstone bridge, the variable stresses of low-dimensional nano-materials are obtained. Meanwhile, the variable strains of low-dimensional nano-materials are obtained by the horizontal displacements between two cantilevers, so the stress-strain curves of low-dimensional nano-materials are worked out. When the low-dimensional nano-materials are measured in the power state, the voltage-current curves are also obtained. In addition, by the help of high resolution imaging system in the transmission electron microscopy, the mechanical-electrical-microstructure relationship of the nano-materials can be recorded in situ and in atomic lattice resolution.

    Abstract translation: 提供了用于定量测量纳米材料的机电性能和微结构的传感器以及用于传感器的制造方法。 传感器包括悬挂结构,压敏电阻悬臂,支撑梁,双金属条等部件。 当双金属条产生弯曲变形时,压敏电阻悬臂之一被致动,然后拉伸驱动另一个压敏电阻悬臂弯曲的低维纳米材料。 通过惠斯通电桥输出的信号变化,得到了低维纳米材料的可变应力。 同时,通过两个悬臂之间的水平位移获得了低维纳米材料的可变应变,得出了低维纳米材料的应力 - 应变曲线。 当在功率状态下测量低维纳米材料时,也获得电压 - 电流曲线。 此外,通过透射电子显微镜中的高分辨率成像系统的帮助,可以原位和原子晶格分辨率记录纳米材料的机械 - 电 - 微结构关系。

    SENSOR FOR QUANTITATIVE MEASUREMENT OF ELECTROMECHANICAL PROPERTIES AND MICROSTRUCTURE OF NANO-MATERIALS AND METHOD FOR MAKING THE SAME
    2.
    发明申请
    SENSOR FOR QUANTITATIVE MEASUREMENT OF ELECTROMECHANICAL PROPERTIES AND MICROSTRUCTURE OF NANO-MATERIALS AND METHOD FOR MAKING THE SAME 有权
    用于定量测量纳米材料的机械性能和微结构的传感器及其制造方法

    公开(公告)号:US20110107472A1

    公开(公告)日:2011-05-05

    申请号:US12756131

    申请日:2010-04-07

    Abstract: A sensor for quantitative test electromechanical properties and microstructure of nano-materials and a manufacturing method for the sensor are provided. The sensor comprises a suspended structure, pressure-sensitive resistor cantilevers, support beams, bimetallic strip and other components. When the bimetallic strip produces bending deformation, one of the pressure-sensitive resistor cantilevers is actuated and then stretches the low-dimensional nano-materials which drive the other pressure-sensitive resistor cantilever to bend. Through signal changes are outputted by the Wheatstone bridge, the variable stresses of low-dimensional nano-materials are obtained. Meanwhile, the variable strains of low-dimensional nano-materials are obtained by the horizontal displacements between two cantilevers, so the stress-strain curves of low-dimensional nano-materials are worked out. When the low-dimensional nano-materials are measured in the power state, the voltage-current curves are also obtained. In addition, by the help of high resolution imaging system in the transmission electron microscopy, the mechanical-electrical-microstructure relationship of the nano-materials can be recorded in situ and in atomic lattice resolution.

    Abstract translation: 提供了用于定量测试的用于纳米材料的机电性能和微结构的传感器以及用于传感器的制造方法。 传感器包括悬挂结构,压敏电阻悬臂,支撑梁,双金属条等部件。 当双金属条产生弯曲变形时,压敏电阻悬臂之一被致动,然后拉伸驱动另一个压敏电阻悬臂弯曲的低维纳米材料。 通过惠斯通电桥输出的信号变化,得到了低维纳米材料的可变应力。 同时,通过两个悬臂之间的水平位移获得了低维纳米材料的可变应变,得出了低维纳米材料的应力 - 应变曲线。 当在功率状态下测量低维纳米材料时,也获得电压 - 电流曲线。 此外,通过透射电子显微镜中的高分辨率成像系统的帮助,可以原位和原子晶格分辨率记录纳米材料的机械 - 电 - 微结构关系。

    Double tilt transmission electron microscope sample holder for in-situ measurement of microstructures
    3.
    发明授权
    Double tilt transmission electron microscope sample holder for in-situ measurement of microstructures 有权
    双倾斜透射电子显微镜样品架用于原位测量微结构

    公开(公告)号:US08569714B2

    公开(公告)日:2013-10-29

    申请号:US13519291

    申请日:2011-07-11

    Abstract: A double tilt sample holder for in-situ measuring mechanical and electrical properties of microstructures in transmission electron microscope (TEM) is provided. The sample holder includes a home-made hollow sample holder body, a sensor for measuring mechanical/electrical properties, a pressing piece, a sample holder head, a sensor carrier. The sensor for measuring mechanical/electrical properties is fixed on the sensor carrier on the sample holder head by the pressing piece, while the sensor carrier is connected to the sample holder head through a pair of supporting shafts located on sides of the sample holder head. The sensor carrier can tilt within the plane perpendicular to the ample holder head by revolving around the supporting shafts (i.e. tilting along Y axis at an angle of ±30°). The sample holder also allows obtaining mechanical/electrical parameters concurrently.

    Abstract translation: 提供了一种用于在透射电子显微镜(TEM)中原位测量微结构的机械和电学性能的双倾斜样品架。 样品架包括自制的中空样品保持器主体,用于测量机械/电气特性的传感器,按压件,样品架头,传感器载体。 用于测量机械/电气性能的传感器通过按压件固定在样品架头上的传感器载体上,而传感器载体通过位于样品架头侧面的一对支撑轴连接到样品架头。 通过围绕支撑轴旋转(即,沿着Y轴以±30°的角度倾斜),传感器载体可以在与大量保持器头部垂直的平面内倾斜。 样品架也可以同时获得机械/电气参数。

    Double Tilt Transmission Electron Microscope Sample Holder for In-Situ Measurement of Microstructures
    4.
    发明申请
    Double Tilt Transmission Electron Microscope Sample Holder for In-Situ Measurement of Microstructures 有权
    双倾斜透射电子显微镜样品架,用于原位测量微结构

    公开(公告)号:US20130105706A1

    公开(公告)日:2013-05-02

    申请号:US13519291

    申请日:2011-07-11

    Abstract: A double tilt sample holder for in-situ measuring mechanical and electrical properties of microstructures in transmission electron microscope (TEM) is provided. The sample holder includes a home-made hollow sample holder body, a sensor for measuring mechanical/electrical properties, a pressing piece, a sample holder head, a sensor carrier. The sensor for measuring mechanical/electrical properties is fixed on the sensor carrier on the sample holder head by the pressing piece, while the sensor carrier is connected to the sample holder head through a pair of supporting shafts located on sides of the sample holder head. The sensor carrier can tilt within the plane perpendicular to the ample holder head by revolving around the supporting shafts (i.e. tilting along Y axis at an angle of ±30°). The sample holder also allows obtaining mechanical/electrical parameters concurrently.

    Abstract translation: 提供了一种用于在透射电子显微镜(TEM)中原位测量微结构的机械和电学性能的双倾斜样品架。 样品架包括自制的中空样品保持器主体,用于测量机械/电气特性的传感器,按压件,样品架头,传感器载体。 用于测量机械/电气性能的传感器通过按压件固定在样品架头上的传感器载体上,而传感器载体通过位于样品架头侧面的一对支撑轴连接到样品架头。 通过围绕支撑轴旋转(即,沿着Y轴以±30°的角度倾斜),传感器载体可以在与大量保持器头部垂直的平面内倾斜。 样品架也可以同时获得机械/电气参数。

    DEVICE AND METHOD FOR MEASURING ELECTROMECHANICAL PROPERTIES AND MICROSTRUCTURE OF NANO-MATERIALS UNDER STRESS STATE
    5.
    发明申请
    DEVICE AND METHOD FOR MEASURING ELECTROMECHANICAL PROPERTIES AND MICROSTRUCTURE OF NANO-MATERIALS UNDER STRESS STATE 失效
    用于测量应力状态下纳米材料的机械性能和微结构的装置和方法

    公开(公告)号:US20100154557A1

    公开(公告)日:2010-06-24

    申请号:US12632597

    申请日:2009-12-07

    CPC classification number: G01N3/08 G01N2203/0282 G01N2203/0286

    Abstract: A device for measuring electromechanical properties and microstructure of nano-materials under stress state comprises two bimetallic strips placed on an insulated metal ring plated with insulating paint, wherein the two bimetallic strips are placed in parallel or V-shaped to insulated metal ring on the same plane, one end of each bimetallic strip is fixed on the insulated metal ring, the other end of the bimetallic strip hangs inside of the insulated ring, the distance of two bimetallic strips were controlled within 0.002-1 mm. Also provided is a method for measuring electromechanical properties and microstructure of nano-materials under stress state.

    Abstract translation: 用于测量纳米材料在应力状态下的机电性能和显微组织的装置包括两个双金属条,放置在镀有绝缘涂料的绝缘金属环上,其中两个双金属条被放置在平行的或V形的绝缘金属环上 每个双金属条的一端固定在绝缘金属环上,双金属条的另一端悬挂在绝缘环的内部,两个双金属条的距离控制在0.002-1mm之内。 还提供了一种用于在应力状态下测量纳米材料的机电性能和微结构的方法。

    Device and method for measuring electromechanical properties and microstructure of nano-materials under stress state
    6.
    发明授权
    Device and method for measuring electromechanical properties and microstructure of nano-materials under stress state 失效
    纳米材料在应力状态下机电性能和显微组织的测量装置及方法

    公开(公告)号:US08069733B2

    公开(公告)日:2011-12-06

    申请号:US12632597

    申请日:2009-12-07

    CPC classification number: G01N3/08 G01N2203/0282 G01N2203/0286

    Abstract: A device for measuring electromechanical properties and microstructure of nano-materials under stress state comprises two bimetallic strips placed on an insulated metal ring plated with insulating paint, wherein the two bimetallic strips are placed in parallel or V-shaped to insulated metal ring on the same plane, one end of each bimetallic strip is fixed on the insulated metal ring, the other end of the bimetallic strip hangs inside of the insulated ring, the distance of two bimetallic strips were controlled within 0.002-1 mm. Also provided is a method for measuring electromechanical properties and microstructure of nano-materials under stress state.

    Abstract translation: 用于测量纳米材料在应力状态下的机电性能和显微组织的装置包括两个双金属条,放置在镀有绝缘涂料的绝缘金属环上,其中两个双金属条被放置在平行的或V形的绝缘金属环上 每个双金属条的一端固定在绝缘金属环上,双金属条的另一端悬挂在绝缘环的内部,两个双金属条的距离控制在0.002-1mm之内。 还提供了一种用于在应力状态下测量纳米材料的机电性能和微结构的方法。

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