公开(公告)号：US09721724B2

公开(公告)日：2017-08-01

申请号：US13822659

申请日：2011-08-05

申请人： Tohru Obata

发明人： Tohru Obata

IPC分类号： H01F41/00 ,  C22C38/00 ,  C22C38/06 ,  C22C38/10 ,  C22C38/16 ,  H01F41/02 ,  C22C33/02 ,  H01F1/057

CPC分类号： H01F41/00 ,  C22C33/02 ,  C22C38/002 ,  C22C38/005 ,  C22C38/06 ,  C22C38/10 ,  C22C38/16 ,  C22C2202/02 ,  H01F1/0577 ,  H01F41/0293

摘要： [Problem] To provide a highly efficient manufacturing method including an RH supply-diffusion process by which the number of magnets processed at a time can be increased without allowing sintered R-T-B based magnets to stick to holding members.[Solution] A method for producing a sintered R-T-B based magnet including the steps of: forming a stack of RH diffusion sources and sintered R-T-B based magnet bodies by stacking the diffusion sources and the magnet bodies alternately with a holding member having openings interposed; and carrying out an RH supply-diffusion process by loading the stack into a process vessel and creating an atmosphere with a pressure of 0.1 Pa to 50 Pa and a temperature of 800° C. to 950° C. within the process vessel.

公开(公告)号：US20130181039A1

公开(公告)日：2013-07-18

申请号：US13822659

申请日：2011-08-05

申请人： Tohru Obata

发明人： Tohru Obata

IPC分类号： H01F41/00

CPC分类号： H01F41/00 ,  C22C33/02 ,  C22C38/002 ,  C22C38/005 ,  C22C38/06 ,  C22C38/10 ,  C22C38/16 ,  C22C2202/02 ,  H01F1/0577 ,  H01F41/0293

摘要： [Problem] To provide a highly efficient manufacturing method including an RH supply-diffusion process by which the number of magnets processed at a time can be increased without allowing sintered R-T-B based magnets to stick to holding members.[Solution] A method for producing a sintered R-T-B based magnet including the steps of: forming a stack of RH diffusion sources and sintered R-T-B based magnet bodies by stacking the diffusion sources and the magnet bodies alternately with a holding member having openings interposed; and carrying out an RH supply-diffusion process by loading the stack into a process vessel and creating an atmosphere with a pressure of 0.1 Pa to 50 Pa and a temperature of 800° C., to 950° C., within the process vessel.

摘要翻译： [问题]提供一种高效率的制造方法，其包括RH供给扩散处理，通过该方法可以增加一次处理的磁体的数量，而不使烧结的R-T-B系磁体粘附到保持构件。 [解决方案]一种制造R-T-B系烧结磁体的方法，包括以下步骤：通过将扩散源和磁体与间隔开的保持构件交替堆叠来形成RH扩散源的叠层和R-T-B系烧结体， 并且通过将堆叠装载到处理容器中并在处理容器内产生压力为0.1Pa至50Pa和温度为800℃至950℃的气氛来进行RH供应扩散处理。