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公开(公告)号：US20240131208A1
公开(公告)日：2024-04-25
申请号：US18547604
申请日：2022-02-24
CPC分类号： A61L2/0047 , H01S3/08004 , H01S3/1643 , A61L2202/11
摘要： The present invention relates to a 215- to 222-nm wavelength laser light generating device comprising: an excitation light source part for converting a laser light with a wavelength of 1030 to 1064 nm to a second harmonic, and generating a laser light with a wavelength of 515 to 532 nm; an optical parametric oscillating part for generating a signal light with a wavelength of 858 to 887 nm and an idler light with a wavelength of 1288 to 1330 nm using the laser light with the wavelength of 515 to 532 nm as an excitation light; a separating part for separating the signal light and the idler light; a first wavelength converting part for generating a fourth harmonic from the signal light; a second wavelength converting part for generating a deep ultraviolet light with a wavelength of 215 to 222 nm by sum frequency with a second harmonic of the excitation light from the idler light; and a coupling part for coupling the fourth harmonic from the first wavelength converting part and the deep ultraviolet light from the second wavelength converting part. The present invention provides a laser generating device that enables to generate simply and efficiently a pulse laser light with a wavelength of 215 to 222 nm including a wavelength of 222 nm disinfecting microorganisms.
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公开(公告)号：US20240226348A9
公开(公告)日：2024-07-11
申请号：US18547616
申请日：2022-02-24
CPC分类号： A61L2/0047 , G02F1/3532 , G02F1/37 , H01S3/0092 , H01S3/109 , H01S3/08004
摘要： The present invention relates to a 399.08-nm wavelength ultraviolet laser light generating device, comprising: an excitation light source part for converting a 1064.2-nm laser light to a second harmonic, and generating a 532.1-nm laser light; an optical parametric oscillating part for generating a 798.15-nm signal light and a 1596.3-nm idler light using the 532.1-nm laser light; a first wavelength converting part for generating a 399.08-nm light by sum frequency generation of the 1596.3 nm idler light and a 532.1-nm light; and a second wavelength converting part for generating a 399.08-nm light of a second harmonic from the 798.15-nm signal light. The order of the first wavelength converting part and the second wavelength converting part is random. The present invention relates to a 228.04-nm wavelength ultraviolet laser light generating device comprising the 399.08-nm wavelength laser light generating device and a third wavelength converting part for subjecting a 399.08-nm light and a 532.1-nm light to sum frequency generation, and generating a 228.04-nm light. The present invention provides a simple device of generating a 228.04-nm laser light which is a deep ultraviolet ray in high efficiency and a simple 399.08-nm ultraviolet laser light generating device usable as a light source thereof.
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公开(公告)号：US20230406753A1
公开(公告)日：2023-12-21
申请号：US18248162
申请日：2021-09-16
发明人： Minoru KUNIYOSHI , Manabu Sakurai
CPC分类号： C03C3/083 , C03C4/082 , C03C4/085 , C03C4/02 , C03C2203/10
摘要： The present invention relates to a black quartz glass consisting of a composition comprising 63 to 65 mass % of SiO2, 18 to 24 mass % of TiO2, and 12 to 17 mass % of Al2O3, wherein the sum of SiO2, TiO2 and Al2O3 is 100 mass %; and to a method for producing black quartz glass comprising: mixing 63 to 65 mass % of a SiO2 powder, 18 to 24 mass % of a TiO2 powder and 12 to 17 mass % of an Al2O3 powder, filling the mixed powder into a mold and then melting at a maximum temperature of 1700 to 1900° C. in an oxygen-free atmosphere, and cooling to room temperature to obtain the black quartz glass; and further to a product comprising a black quartz glass member made of the black quartz glass. The present invention allows to provide a black quartz glass which has an excellent light-shielding property, has no risk of causing contamination in a step of using it, has sufficient color uniformity when the size is enlarged, and is capable of producing a large ingot, and to provide a method for producing the black quartz glass with excellent productivity even in the large ingot, and to provide a black quartz glass product made of the black quartz glass.
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公开(公告)号：US20240131209A1
公开(公告)日：2024-04-25
申请号：US18547616
申请日：2022-02-24
CPC分类号： A61L2/0047 , G02F1/3532 , G02F1/37 , H01S3/0092 , H01S3/109 , H01S3/08004
摘要： The present invention relates to a 399.08-nm wavelength ultraviolet laser light generating device, comprising: an excitation light source part for converting a 1064.2-nm laser light to a second harmonic, and generating a 532.1-nm laser light; an optical parametric oscillating part for generating a 798.15-nm signal light and a 1596.3-nm idler light using the 532.1-nm laser light; a first wavelength converting part for generating a 399.08-nm light by sum frequency generation of the 1596.3 nm idler light and a 532.1-nm light; and a second wavelength converting part for generating a 399.08-nm light of a second harmonic from the 798.15-nm signal light. The order of the first wavelength converting part and the second wavelength converting part is random. The present invention relates to a 228.04-nm wavelength ultraviolet laser light generating device comprising the 399.08-nm wavelength laser light generating device and a third wavelength converting part for subjecting a 399.08-nm light and a 532.1-nm light to sum frequency generation, and generating a 228.04-nm light. The present invention provides a simple device of generating a 228.04-nm laser light which is a deep ultraviolet ray in high efficiency and a simple 399.08-nm ultraviolet laser light generating device usable as a light source thereof.
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公开(公告)号：US20240002273A1
公开(公告)日：2024-01-04
申请号：US18247443
申请日：2021-09-16
发明人： Minoru KUNIYOSHI , Manabu Sakurai
CPC分类号： C03C3/06 , C03C4/02 , C03C4/082 , C03C1/002 , C03B19/063 , C03B19/066 , C03C2201/02 , C03C2204/04
摘要： The present invention relates to a black quartz glass comprising Si of 0.5 to 10 mass %, SiO of 0.1 to 5 mass % and SiO2 of the residue, wherein the SCE reflectance at a wavelength of 350 nm to 750 nm is 10% or less; a method for producing the black quartz glass, comprising: pressure-molding a powder obtained by mixing and consolidating (1) fumed silica, or (2) a mixture powder of fumed silica and a synthetic silica powder, or (3) a mixture powder of fumed silica, spherical silica and a synthetic silica powder, with a Si powder of 0.5 to 10 mass % and a SiO powder of 0.1 to 5 mass %, and heating and sintering the pressure-molded product in the atmosphere; and a product comprising a black quartz glass member made of the black quartz glass. The present invention allows to provide a black quartz glass which has an excellent light-shielding property, has no risk of causing contamination in a step of using it, has sufficient color uniformity when the size is enlarged, and is capable of producing a large ingot, and to provide a method for producing the black quartz glass with excellent productivity even in the large ingot, and to provide a black quartz glass product made of the black quartz glass.
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6.发明申请Highly durable silica glass, process and apparatus for producing same, and member and apparatus provided with same 有权高耐用的二氧化硅玻璃，其制造方法和装置以及具有该玻璃的构件和装置公开(公告)号：US20040116269A1
公开(公告)日：2004-06-17
申请号：US10718575
申请日：2003-11-24
发明人： Yoshinori Harada , Shuzo Mizutani , Shinkichi Hashimoto , Masakazu Kudoh , Naoki Miura , Katsufumi Takahashi , Hideki Kiyohara
IPC分类号： C03C003/06 , C03B019/06
CPC分类号： C03B19/01 , C03B19/095 , C03B19/1423 , C03B19/1453 , C03B2201/07 , C03B2201/32 , C03B2201/34 , C03B2201/40 , C03B2201/54 , C03C3/06 , C03C2201/34 , C03C2201/3411 , C03C2201/40 , C03C2201/54 , Y02P40/57
摘要： Highly durable silica glass containing 0.01% to 2% by weight of at least one element selected from magnesium, calcium, strontium, barium, yttrium, hafnium and zirconium. The silica glass is produced by melting a powdery material comprising a finely divided silica powder and a finely divided zirconium-containing substance by oxyhydrogen flame or plasma are to form an accumulated molten material layer, and extending the molten material layer outwardly in radial directions.
摘要翻译： 含有0.01重量％至2重量％的选自镁，钙，锶，钡，钇，铪和锆中的至少一种元素的高耐用二氧化硅玻璃。 二氧化硅玻璃是通过熔化包含细碎的二氧化硅粉末和细分的含锆物质的粉末状材料通过氢氧焰或等离子体而形成的，以形成聚集的熔融材料层，并使熔融材料层沿径向向外延伸。
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公开(公告)号：US20240226347A9
公开(公告)日：2024-07-11
申请号：US18547604
申请日：2022-02-24
CPC分类号： A61L2/0047 , H01S3/08004 , H01S3/1643 , A61L2202/11
摘要： The present invention relates to a 215- to 222-nm wavelength laser light generating device comprising: an excitation light source part for converting a laser light with a wavelength of 1030 to 1064 nm to a second harmonic, and generating a laser light with a wavelength of 515 to 532 nm; an optical parametric oscillating part for generating a signal light with a wavelength of 858 to 887 nm and an idler light with a wavelength of 1288 to 1330 nm using the laser light with the wavelength of 515 to 532 nm as an excitation light; a separating part for separating the signal light and the idler light; a first wavelength converting part for generating a fourth harmonic from the signal light; a second wavelength converting part for generating a deep ultraviolet light with a wavelength of 215 to 222 nm by sum frequency with a second harmonic of the excitation light from the idler light; and a coupling part for coupling the fourth harmonic from the first wavelength converting part and the deep ultraviolet light from the second wavelength converting part. The present invention provides a laser generating device that enables to generate simply and efficiently a pulse laser light with a wavelength of 215 to 222 nm including a wavelength of 222 nm disinfecting microorganisms.
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公开(公告)号：US20240217866A1
公开(公告)日：2024-07-04
申请号：US18558213
申请日：2023-02-20
发明人： Manabu SAKURAI , Minoru KUNIYOSHI , Takayuki KIKUCHI , Yuta SHIMASAKI , Mori BAMBA , Yuki Itoh
CPC分类号： C03C11/00 , C03B19/063 , C03B19/066
摘要： An object of the present invention is to provide an opaque quartz glass containing pores with irregular shapes and having sufficient heat ray reflecting, heat ray blocking and light shielding properties, and further to provide a method for producing the opaque quartz glass. The opaque quartz glass of the present invention is an opaque quartz glass containing pores with irregular shapes dispersed in a glass body, wherein the opaque quartz glass has a pore size distribution of the pores having D50 of 4 to 30 μm, a proportion of pores with pore sizes of 5 μm or less of 1 to 50%, and a proportion of pores with pore sizes of 15 μm or less of 30 to 90%, and an area ratio of pores in a microscopic image at a cross section of 5% or more. The opaque quartz glass of the present invention is obtained by mixing a plurality of types of the specific silica powders having different particle size distributions from each other at a predetermined formulation, and sintering a pressure-molded article of the mixed powder.
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