Electrically pumped edge-emitting photonic bandgap semiconductor laser
    2.
    发明授权
    Electrically pumped edge-emitting photonic bandgap semiconductor laser 有权
    电泵浦边缘发射光子带隙半导体激光器

    公开(公告)号:US06674778B1

    公开(公告)日:2004-01-06

    申请号:US10044488

    申请日:2002-01-09

    CPC classification number: B82Y20/00 H01S5/10 H01S5/1042 H01S5/105 H01S5/3415

    Abstract: A highly efficient, electrically pumped edge-emitting semiconductor laser based on a one- or two-dimensional photonic bandgap (PBG) structure is described. The laser optical cavity is formed using a pair of PBG mirrors operating in the photonic band gap regime. Transverse confinement is achieved by surrounding an active semiconductor layer of high refractive index with lower-index cladding layers. The cladding layers can be electrically insulating in the passive PBG mirror and waveguide regions with a small conducting aperture for efficient channeling of the injection pump current into the active region. The active layer can comprise a quantum well structure. The quantum well structure can be relaxed in the passive regions to provide efficient extraction of laser light from the active region.

    Abstract translation: 描述了基于一维或二维光子带隙(PBG)结构的高效电泵浦边缘发射半导体激光器。 使用在光子带隙状态下操作的一对PBG镜来形成激光光腔。 通过围绕具有较低折射率覆层的高折射率的有源半导体层来实现横向约束。 包层可以在具有小导电孔的无源PBG反射镜和波导区域中电绝缘,用于将注入泵电流有效地引导到有源区域中。 有源层可以包括量子阱结构。 可以在无源区域中放宽量子阱结构,以提供从有源区域提供有效的激光。

    Photodetectors with passive thermal radiation control
    3.
    发明授权
    Photodetectors with passive thermal radiation control 有权
    具有被动热辐射控制的光电探测器

    公开(公告)号:US06297496B1

    公开(公告)日:2001-10-02

    申请号:US09447535

    申请日:1999-11-23

    CPC classification number: H01L31/09 C09D5/32 H01L31/02164

    Abstract: A new class of photodetectors which include means for passive shielding against undesired thermal radiation is disclosed. Such devices can substitute in applications currently requiring cooled optical sensors, such as IR detection and imaging. This description is included for purposes of searching, and is not intended to limit or otherwise influence the interpretation of the present invention.

    Abstract translation: 公开了一类新的光电探测器,其包括用于被动屏蔽以防止不期望的热辐射的装置。 这样的设备可以替代目前需要冷却的光学传感器的应用,例如IR检测和成像。 为了搜索而包含该描述,并不意图限制或以其它方式影响本发明的解释。

    INTEGRATED POLARIZED LIGHT EMITTING DIODE WITH A BUILT-IN ROTATOR
    4.
    发明申请
    INTEGRATED POLARIZED LIGHT EMITTING DIODE WITH A BUILT-IN ROTATOR 有权
    集成偏振光发射二极管与内置旋转器

    公开(公告)号:US20130161677A1

    公开(公告)日:2013-06-27

    申请号:US13810380

    申请日:2011-07-19

    Abstract: The invention is directed to an integrated polarized light emitting diode device that has a light emitting diode, a metal grating, an oxide layer, and a built-in photonic crystal rotator. Additional teachings include a method for making the integrated polarized light emitting diode, a method for improving the polarization selectivity and energy efficiency of a light emitting diode, and a method for rotating polarization of a light emitting diode.

    Abstract translation: 本发明涉及一种具有发光二极管,金属光栅,氧化物层和内置光子晶体旋转器的集成偏振发光二极管器件。 附加的教导包括制造集成偏振发光二极管的方法,改善发光二极管的极化选择性和能量效率的方法,以及用于旋转发光二极管的偏振的方法。

    Method to fabricate layered material compositions
    6.
    发明授权
    Method to fabricate layered material compositions 有权
    制造分层材料组合物的方法

    公开(公告)号:US06812482B2

    公开(公告)日:2004-11-02

    申请号:US09941820

    申请日:2001-08-28

    CPC classification number: G02B6/1225 B82Y20/00

    Abstract: A new class of processes suited to the fabrication of layered material compositions is disclosed. Layered material compositions are typically three-dimensional structures which can be decomposed into a stack of structured layers. The best known examples are the photonic lattices. The present invention combines the characteristic features of photolithography and chemical-mechanical polishing to permit the direct and facile fabrication of, e.g., photonic lattices having photonic bandgaps in the 0.1-20&mgr; spectral range.

    Abstract translation: 公开了一类适用于分层材料组合物制造的工艺。 分层材料组合物通常是三维结构,其可以分解成一堆结构化层。 最着名的例子是光子晶格。 本发明组合了光刻和化学 - 机械抛光的特征,以允许直接和容易地制造例如在0.1-20mu光谱范围内具有光子带隙的光子晶格。

    Use of chemical-mechanical polishing for fabricating photonic bandgap
structures
    7.
    发明授权
    Use of chemical-mechanical polishing for fabricating photonic bandgap structures 失效
    使用化学机械抛光制造光子带隙结构

    公开(公告)号:US5998298A

    公开(公告)日:1999-12-07

    申请号:US67614

    申请日:1998-04-28

    CPC classification number: G02B6/1225 B82Y20/00 G02B6/132 G02B2006/12176

    Abstract: A method is disclosed for fabricating a two- or three-dimensional photonic bandgap structure (also termed a photonic crystal, photonic lattice, or photonic dielectric structure). The method uses microelectronic integrated circuit (IC) processes to fabricate the photonic bandgap structure directly upon a silicon substrate. One or more layers of arrayed elements used to form the structure are deposited and patterned, with chemical-mechanical polishing being used to planarize each layer for uniformity and a precise vertical tolerancing of the layer. The use of chemical-mechanical planarization allows the photonic bandgap structure to be formed over a large area with a layer uniformity of about two-percent. Air-gap photonic bandgap structures can also be formed by removing a spacer material separating the arrayed elements by selective etching. The method is useful for fabricating photonic bandgap structures including Fabry-Perot resonators and optical filters for use at wavelengths in the range of about 0.2-20 .mu.m.

    Abstract translation: 公开了一种用于制造二维或三维光子带隙结构(也称为光子晶体,光子晶格或光子介质结构)的方法。 该方法使用微电子集成电路(IC)工艺在硅衬底上直接制造光子带隙结构。 用于形成结构的一层或多层阵列元件被沉积和图案化,其中使用化学机械抛光来平整每层以获得均匀性和层的精确垂直公差。 使用化学机械平面化可以使光子带隙结构形成在大面积上,层间均匀度约为2%。 气隙光子带隙结构也可以通过去除通过选择性蚀刻分离排列元件的间隔物材料来形成。 该方法可用于制造光子带隙结构,包括法布里 - 珀罗谐振器和用于波长在0.2-20μm范围内的滤光器。

    Method to fabricate layered material compositions
    10.
    发明授权
    Method to fabricate layered material compositions 有权
    制造分层材料组合物的方法

    公开(公告)号:US06358854B1

    公开(公告)日:2002-03-19

    申请号:US09296702

    申请日:1999-04-21

    CPC classification number: G02B6/1225 B82Y20/00

    Abstract: A new class of processes suited to the fabrication of layered material compositions is disclosed. Layered material compositions are typically three-dimensional structures which can be decomposed into a stack of structured layers. The best known examples are the photonic lattices. The present invention combines the characteristic features of photolithography and chemical-mechanical polishing to permit the direct and facile fabrication of, e.g., photonic lattices having photonic bandgaps in the 0.1-20&mgr; spectral range.

    Abstract translation: 公开了一类适用于分层材料组合物制造的工艺。 分层材料组合物通常是三维结构,其可以分解成一堆结构化层。 最着名的例子是光子晶格。 本发明组合了光刻和化学 - 机械抛光的特征,以允许直接和容易地制造例如在0.1-20mu光谱范围内具有光子带隙的光子晶格。

Patent Agency Ranking